Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Adjustable Fano resonance integrated device and preparation method thereof

An integrated device and resonance technology, which is applied in the field of tunable Fano resonance integrated devices and their preparation, can solve the problem that the resonance wavelength and slope of the Fano resonance spectral line cannot be adjusted, and the device cannot guarantee the stable generation of high-sharp Fano resonance spectral lines. and other problems, to achieve the effect of high application prospects

Active Publication Date: 2020-05-19
SUN YAT SEN UNIV
View PDF5 Cites 6 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] In order to overcome the technical defect that the resonant wavelength and slope of the Fano resonant spectral line produced by the existing microring resonator cannot be adjusted, and there is no guarantee that the device can stably generate a high-sharp Fano resonant spectral line, the present invention provides a device that can Tuofano resonant integrated device and its preparation method

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Adjustable Fano resonance integrated device and preparation method thereof
  • Adjustable Fano resonance integrated device and preparation method thereof
  • Adjustable Fano resonance integrated device and preparation method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0034] Such as figure 1 As shown, an adjustable Fano resonant integrated device includes a substrate 1, and also includes a microring waveguide 2 and a coupling straight waveguide 3 integrated on the substrate 1, and the top surface of the coupling straight waveguide 3 is provided The grating reflector 4 located at both ends of the coupling area and the micro heater 5 arranged above the micro-ring waveguide 2 .

[0035] In the specific implementation process, the Fabry-Perot resonator is formed by coupling the two grating reflectors 4 on the top surface of the straight waveguide 3. When the light wave enters from one end of the coupled straight waveguide 3, a part of the light is coupled into the microring resonator , oscillating to form a narrow Lorentz resonance line shape, the other part of the light oscillates in the Fabry-Perot resonator to form a wider resonance peak, and the two parts of light are coupled out to obtain the Fano resonance peak. The micro-heater 5 set ab...

Embodiment 2

[0044] More specifically, on the basis of Example 1, such as figure 2 Shown in (a), (b), (c), (d), (e), and (f), a method for preparing an adjustable Fano resonant integrated device comprises the following steps:

[0045] S1: On the substrate 03, a deuterated silicon nitride layer 02 with a thickness of 560 nanometers is deposited by a chemical vapor phase method, and a positive photoresist 01 is spin-coated;

[0046] S2: Electron beam exposure is performed after spin-coating positive photoresist, and the micro-ring waveguide and coupled straight waveguide mask patterns are obtained after development;

[0047] S3: Etching out the microring waveguide 2 and the coupling straight waveguide 3 through a reactive ion etching process, and removing the photoresist;

[0048] S4: Spin-coat positive photoresist, perform electron beam exposure, and obtain a grating structure mask pattern after development, and shallowly etch a grating structure through a reactive ion etching process to ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
Widthaaaaaaaaaa
Widthaaaaaaaaaa
Lengthaaaaaaaaaa
Login to View More

Abstract

The invention provides an adjustable Fano resonance integrated device. The device comprises a substrate, and further comprises a micro-ring waveguide and a coupling straight waveguide which are integrated on the substrate, wherein grating reflectors which are arranged on a top surface of a coupling straight waveguide and are positioned at two ends of a coupling region, and a micro heater which isarranged above the micro-ring waveguide. The invention further provides a manufacturing method of the device, a grating is etched on a top surface of the coupling waveguide to form the partial reflectors, a Fabry-Perot resonant cavity is formed between the two partial reflectors and acts with the micro-ring resonant cavity, namely, the micro-ring resonant mode is coupled with the Fabry-Perot resonant mode, and a Fabry-Perot resonant spectral line is formed at an output end. The resonance wavelength of the micro-ring is thermally adjusted by externally applying a voltage to the micro heater, sothe resonance wavelength and slope of the Fano resonant spectral line can be flexibly adjusted. The device can stably generate high-sharpness fano resonance spectral lines, can be used for large-scale tape-out production of a general semiconductor micromachining platform, and has a high application prospect.

Description

technical field [0001] The invention relates to the technical field of optoelectronic devices, and more specifically, to an adjustable Fano resonant integrated device and a preparation method thereof. Background technique [0002] Waveguide-integrated microring resonators play an important role in many photonic integrated device applications due to their simple fabrication process, compact structure, easy integration and high Q value, and have unique advantages in optical biosensing. The light wave propagates through total reflection in the waveguide to form a guided mode. The change of the refractive index on the outer surface of the waveguide can be reflected as the guided mode and the change of the output light field through the induction of the evanescent light field, and the response to the external refractive index is generated to realize the sensing. And there is no need to label the test substance. The resonance effect of the ring resonator can greatly enhance the i...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): G02B6/293G03F7/00
CPCG02B6/29338G02B6/29358G03F7/00
Inventor 陈钰杰许梓涵吴泽儒汤莎张彦峰余思远
Owner SUN YAT SEN UNIV
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products