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Infrared germanium carbide film, infrared material with germanium carbide film, preparation method and application of germanium carbide film

A technology of infrared material and germanium carbide film, which is applied in metal material coating process, ion implantation plating, coating, etc., can solve the problems of large infrared absorption and uneven distribution of film components, and achieve small infrared absorption, The effect of uniform distribution of film composition and small stress

Inactive Publication Date: 2020-06-19
CHINA BUILDING MATERIALS ACAD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

The germanium carbide film can be applied to the surface of infrared substrates such as chalcogenide glass, zinc sulfide, germanium, silicon, etc., to play the role of infrared antireflection and physical and chemical protection, so as to solve the problem of large infrared absorption in the process of depositing carbon film by sputtering. The problem of uneven distribution of film components

Method used

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  • Infrared germanium carbide film, infrared material with germanium carbide film, preparation method and application of germanium carbide film
  • Infrared germanium carbide film, infrared material with germanium carbide film, preparation method and application of germanium carbide film
  • Infrared germanium carbide film, infrared material with germanium carbide film, preparation method and application of germanium carbide film

Examples

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preparation example Construction

[0043] A kind of preparation method of germanium carbide film that the present invention proposes, comprises the following steps:

[0044] 1) The infrared germanium material and the graphite material are uniformly mixed at an atomic ratio of 1:99 to 99:1, and sintered at 300°C to 2000°C and 0.1 ton to 2,000 tons;

[0045] 2) placing the material obtained in step 1) as a sputtering target in a sputtering environment, and removing impurities on the surface of the infrared substrate;

[0046]3) Put the infrared substrate obtained in step 2) into a sputtering environment, and then deposit the material obtained in step 1) on the surface of the infrared substrate.

[0047] The aforementioned sputtering may be magnetron sputtering or ion beam sputtering.

[0048] In the above step 1), the particle size range of the infrared germanium material and graphite material can be 0.001 μm to 5000 μm, and the atomic ratio range of the infrared germanium material and graphite material can be (...

Embodiment 1

[0069] This embodiment provides a method for preparing a germanium carbide film, comprising the following steps:

[0070] 1) Weigh the infrared germanium material and the graphite material according to the atomic ratio of 50:50, then put the two materials into a ball mill and grind them into powders with an average particle size of 30 μm, and mix them uniformly at the same time, and put the uniformly mixed germanium-graphite powder in the Sintering at 700°C and 100 tons of high pressure (high temperature and high pressure sintering furnace) to obtain a germanium-graphite hot-pressed sintered round cake with a size of Ф60mm×5mm;

[0071] 2) Put the hot-pressed sintered round cake obtained in step 1) as a sputtering target into the magnetron sputtering target as a sputtering target, and select a size of IRG206 chalcogenide glass, wipe it with a dust-free cloth dripped with a mixture of absolute ethanol and ether (the volume ratio of the two is 3:1);

[0072] 3) Put the cleaned...

Embodiment 2

[0074] The difference between this example and Example 1 is that 1) the infrared germanium material and the graphite material are weighed according to the atomic ratio of 45:55, and then the two materials are put into a ball mill to be ground into a powder with an average particle size of 20 μm. Mixing, sintering the uniformly mixed germanium-graphite powder at 500°C and 20 tons of high pressure (high temperature and high pressure sintering furnace) to obtain a germanium-graphite hot-pressed sintered round cake with a size of Ф60mm×5mm; 2) Change the sputtering power to For 200W, deposit a germanium carbide film on IRG206 chalcogenide glass, and the rest of the steps are the same.

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Abstract

The invention provides an infrared germanium carbide film, an infrared material with the infrared germanium carbide film and a preparation method and application of the infrared germanium carbide film. The preparation method of the infrared germanium carbide film comprises the following steps that an infrared germanium material and a graphite material are evenly mixed according to the atomic ratioof 1: 99 to 99: 1, infrared germanium carbide film, sintering and forming are carried out infrared germanium carbide film under the condition of 0.1 ton to 2000 tons at the temperature of 300 DEG C to 2000 DEG C; an obtained material as a sputtering target material is placed in a sputtering environment, impurities on the surface of an infrared matrix are removed; and the obtained infrared matrixis placed in the sputtering environment, then the obtained material is deposited on the surface of the infrared matrix, and the germanium carbide film is formed on the surface of the infrared matrix.According to the infrared germanium carbide film, the infrared material with the infrared germanium carbide film and the preparation method and application of the infrared germanium carbide film, thegermanium-graphite powder hot-pressing sintering target is adopted as the sputtering target material to deposit the germanium carbide film, germanium atoms and graphite atoms are uniformly distributedin the germanium-graphite powder hot-pressing sintering target, so that deposited particles sputtered by sputtering ions are uniform, and the film layer with uniform component distribution, few internal defects, small infrared absorption and small stress can be obtained.

Description

technical field [0001] The invention belongs to the technical field of infrared protection and anti-reflection film, and specifically relates to an infrared germanium carbide film with low infrared absorption, low stress and high hardness, an infrared material with a germanium carbide film, a preparation method and application thereof. Background technique [0002] Infrared thermal imaging systems are more and more widely used in military and civilian fields. They can observe the surrounding environment at night and in heavy fog, and play an early warning and monitoring role. It can also measure the body temperature without contact, which is of great significance to the prevention and control of infectious diseases and other epidemics. The infrared lens is one of the key components of the infrared thermal imaging system, and the infrared anti-reflection protective film on the surface of the infrared lens plays a vital role in the service life and imaging quality of the infra...

Claims

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Application Information

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IPC IPC(8): C23C14/06C23C14/35C23C14/46G02B1/113G02B1/14
CPCC23C14/0635C23C14/3414C23C14/35C23C14/46G02B1/113G02B1/14
Inventor 伏开虎金扬利陈玮高帅孙丽李宝迎刘永华祖成奎
Owner CHINA BUILDING MATERIALS ACAD
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