Chip packaging heat dissipation structure and preparation method thereof
A technology of heat dissipation structure and chip packaging, applied in electrical components, electric solid state devices, circuits, etc., can solve the problems of low heat dissipation efficiency and poor packaging reliability.
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Embodiment 1
[0037] The invention provides a chip packaging heat dissipation structure, the structure of which is as follows: figure 1 As shown, it includes a silicon substrate 11 , a heat sink 12 , a chip slot 13 , a chip 14 , an insertion layer 15 and solder balls 16 . The heat dissipation groove 12 is etched on the front side of the silicon substrate 11, the chip groove 13 is etched on the back side of the silicon substrate 11, and the heat dissipation groove 12 and the chip groove 13 are connected; the chip 14 is pasted in the chip groove 13 by thermally conductive glue, and the back of the chip 14 is flush with the bottom surface of the chip groove 13, and the front of the chip 14 is flush with the opening surface of the chip groove 13; Layer 15 has the function of electrical interconnection and is formed on the bottom of the silicon substrate 11, and the solder balls are formed on the surface of the insertion layer.
[0038] The heat sink 12 is filled with a metal material through a...
Embodiment 2
[0042] The invention provides a method for preparing a chip packaging heat dissipation structure, comprising the following steps:
[0043] A silicon substrate 11 is provided, and a heat sink 12 is made on the front side of the silicon substrate 11 by photolithography and silicon dry etching processes, such as figure 2 shown;
[0044] Fill the heat sink 12 and completely cover the entire surface of the silicon substrate 11 by electroplating a metal material through an electroplating process, such as image 3 Shown; Wherein, the metal material is preferably metal copper, aluminum, titanium-tungsten alloy can also be selected;
[0045] Polish and grind the metal material by grinding and chemical mechanical polishing until the pattern of the heat dissipation groove 12 is exposed, such as Figure 4 shown;
[0046] Fabricate a chip groove 13 on the back side of the silicon substrate 11 by photolithography and silicon dry etching process, such as Figure 5 As shown; the depth of...
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