Quantum dot patternizing method, quantum dot light-emitting device and display device
A quantum dot light-emitting and patterning technology, which is applied in the manufacture of semiconductor devices, electrical solid-state devices, semiconductor/solid-state devices, etc., can solve the problem of poor stability of perovskite quantum dots, affecting pixel light-emitting effect, and easy to block the nozzles of printing equipment, etc. Problems, to achieve the effect of improving the display effect, improving the luminous effect, and uniform thickness
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[0032] In order to make the objectives, technical solutions and advantages of the embodiments of the present invention more clear, the technical solutions of the embodiments of the present invention are described clearly and completely below. Obviously, the described embodiments are some, but not all, embodiments of the present invention. Based on the described embodiments of the present invention, all other embodiments obtained by those of ordinary skill in the art fall within the protection scope of the present invention.
[0033] The patterning method of quantum dots according to the embodiments of the present invention will be described in detail below.
[0034] like figure 1 As shown, the patterning methods of quantum dots include:
[0035] Step S1, injecting the precursor solution into the pixel area on the substrate;
[0036] Step S2, removing the solvent in the precursor solution;
[0037] Step S3, injecting a gas compound into the pixel region, so that the precurs...
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