Vanadium-free slurry treatment device and process

A treatment device and treatment process technology, which is applied in the direction of process efficiency improvement, titanium halide, spray evaporation, etc., can solve the problems such as not considering the recovery and utilization of vanadium, and achieve the effects of reducing energy consumption, saving energy, and ensuring evaporation and separation

Pending Publication Date: 2020-07-17
PANGANG GROUP TITANIUM INDAL
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  • Claims
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Problems solved by technology

However, this process only considers the separation of solid impurities in the mud and the recovery of titanium tetrachloride, and still does not consider the subsequent recovery and utilization of vanadium in the solid impurities in the vanadium removal mud.

Method used

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  • Vanadium-free slurry treatment device and process

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Embodiment Construction

[0023] The present invention will be further described below in conjunction with the accompanying drawings and specific embodiments.

[0024] Such as figure 1 As shown, the vanadium removal mud treatment device of the present invention includes a cyclone dust collector 1 and a gravity dust collector 2, and the cyclone dust collector 1 has a first air inlet port 3, a first air outlet port 4 and a first air outlet port 4. A dust outlet port 5 has a mud inlet port 6, a second air inlet port 7, a second air outlet port 8 and a second dust outlet port 9 on the gravity dust collector 2, and the first air inlet port 3 is used for It communicates with the chlorination furnace flue gas pipeline to supply the chlorination furnace flue gas into the cyclone dust collector 1, the first air outlet port 4 communicates with the second air inlet port 7, and the mud inlet port 6 communicates with the vanadium removal port The mud supply pipeline is communicated to supply the vanadium-removing ...

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Abstract

The invention discloses a vanadium-free slurry treatment device and process, and belongs to the technical field of titanium tetrachloride production. The vanadium-free mud treatment device comprises acyclone dust collector and a gravity dust collector which are connected in series, a vanadium-free mud port is formed in the gravity dust collector, a nozzle is arranged at a mud inlet port, and thenozzle is used for spraying vanadium-free mud into the gravity dust collector. The vanadium-free mud treatment process is a process method for specific treatment on the vanadium-free mud treatment device. The cyclone dust collector and the gravity dust collector which are connected in series are arranged at the same time, dust in the flue gas of a chlorination furnace can be subjected to cyclone dust removal through the cyclone dust collector, and then the vanadium-free mud is introduced into the gravity dust collector, evaporation and separation of the vanadium-free mud are achieved through heat of flue gas of the chlorination furnace, then separation and direct recycling of titanium tetrachloride and solid impurities in the vanadium-free mud are achieved, and the problem that vanadium slag is polluted by dust in the flue gas of the chlorination furnace is avoided.

Description

technical field [0001] The invention relates to the technical field of titanium tetrachloride production, in particular to a vanadium removal mud treatment device and a vanadium removal mud treatment process using the treatment device. Background technique [0002] In the production process of refined titanium tetrachloride, it is necessary to use aluminum powder or fatty acid to remove impurities in crude titanium tetrachloride to obtain refined titanium tetrachloride, and the impurities enter the vanadium removal slurry. The vanadium removal mud contains about 5%-10% solids by mass, and the rest is titanium tetrachloride liquid. In the traditional process, the vanadium-removing slurry is treated with a pulp evaporator, and the vanadium-removing slurry is injected into the crucible of the slurry evaporator, heated by electricity, titanium tetrachloride is evaporated and then condensed and recovered, and the solid impurities are enriched to form vanadium slag; vanadium in th...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C01G23/02C22B7/00C22B7/02C22B34/22B01D1/18B01D45/12
CPCB01D1/18B01D45/12C01G23/022C22B7/00C22B7/02C22B34/22Y02P10/20
Inventor 胡元金
Owner PANGANG GROUP TITANIUM INDAL
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