Photosensitive siloxane composition and pattern forming method using the same
A technology of composition and siloxane, which is applied in photosensitive material processing, optics, optomechanical equipment, etc., can solve the problems of electrical characteristic degradation, cost increase, impurity mixing, etc., and achieve excellent hardness and/or transmittance, pattern The effect of less change in line width
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Synthetic example 1
[0196] Synthesis example 1 (synthesis of polysiloxane Pb-1)
[0197] In a 2L flask equipped with a stirrer, a thermometer, and a condenser, add 49.0 g of 25% by mass tetramethylammonium hydroxide (TMAH) aqueous solution, 600 ml of isopropanol (IPA), and 4.0 g of water, and then add A mixed solution of 68.0 g of methyltrimethoxysilane, 79.2 g of phenyltrimethoxysilane, and 15.2 g of tetramethoxysilane was prepared. This mixed solution was added dropwise at 40°C, stirred at the same temperature for 2 hours, and then neutralized by adding a 10% aqueous HCl solution. 400 ml of toluene and 600 ml of water were added to the neutralization solution, and two phases were separated, and the water phase was removed. Further, washing was performed three times with 300 ml of water, the obtained organic phase was concentrated under reduced pressure to remove the solvent, and PGMEA was added to the concentrate so that the solid content (solid content) concentration became 35% by mass, and ...
Synthetic example 2
[0199] Synthesis example 2 (synthesis of polysiloxane Pb-2)
[0200] In a 2L flask equipped with a stirrer, a thermometer, and a condenser tube, 24.5 g of a 25% by mass TMAH aqueous solution, 600 ml of IPA, and 4.0 g of water were added, and then 81.7 g of methyltrimethoxysilane, benzene, and benzene were prepared in a dropping funnel. A mixed solution of 79.2 g of trimethoxysilane. This mixed solution was added dropwise at 40°C, stirred at the same temperature for 2 hours, and then neutralized by adding a 10% aqueous HCl solution. 400 ml of toluene and 600 ml of water were added to the neutralizing liquid, and two phases were separated, and the water phase was removed. Further, washing was performed three times with 300 ml of water, the solvent was removed by concentrating the obtained organic phase under reduced pressure, and PGMEA was added to the concentrate so that the solid content concentration became 35% by mass for adjustment.
[0201] Mw of the obtained polysilox...
Synthetic example 3
[0202] Synthesis Example 3 (Synthesis of Polysiloxane Pa-1)
[0203] In a 2L flask equipped with a stirrer, a thermometer, and a condenser, add 102 g of a 25% by mass tetramethylammonium hydroxide (TMAH) aqueous solution, 600 ml of isopropanol (IPA), and 4.0 g of water, and then place the mixture in the dropping funnel A mixed solution of 68.0 g of methyltrimethoxysilane, 79.2 g of phenyltrimethoxysilane, and 49.5 g of 1,3-bis(2-trimethoxysilylethyl)tetramethoxydisiloxane was prepared . This mixed solution was added dropwise at 40°C, stirred at the same temperature for 2 hours, and then neutralized by adding a 10% aqueous HCl solution. 400 ml of toluene and 600 ml of water were added to the neutralizing liquid, and two phases were separated, and the water phase was removed. Further, washing was performed three times with 400 ml of water, the solvent was removed by concentrating the obtained organic phase under reduced pressure, and PGMEA was added to the concentrate so tha...
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