The loading and unloading method of PECVD surface coating based on coating detection

Abstract

The invention discloses a PECVD surface coating loading and unloading method based on coating detection, including graphite boat in place, graphite boat upper buffer rack, coating detection before entering the boat, graphite boat entering the reaction chamber, graphite boat exiting the reaction chamber, and sheet taking Pre-coating inspection, graphite boat returning to the insertion and removal machine and other steps. In the present invention, a device for detecting whether the graphite boat is coated or not is installed on the buffer rack, and two steps of whether the coating is detected are added. One is that the manipulator directly grabs the graphite boat without coating on the buffer rack according to the detection result and puts it into the boat pushing mechanism. Then it is sent into the reaction chamber for coating by the push boat mechanism, which can avoid secondary coating in the reaction chamber. The second is that the manipulator grabs the coated graphite boat on the buffer rack according to the test results and puts it on the transmission mechanism, which is sent into the insertion mechanism by the transmission mechanism. The slicer takes slices to prevent uncoated silicon wafers from flowing into the next process, to ensure that each boat of silicon wafers is fully coated, and there is no repeated coating, ensuring a smooth production process.

Description

technical field

[0001] The invention relates to a PECVD surface coating process, in particular to a method for loading and unloading PECVD surface coatings based on coating detection. Background technique

[0002] PECVD (Plasma Enhanced Chemical Vapor Deposition, PECVD equipment includes three parts, namely gas source cabinet, furnace cabinet and purification platform, the reaction chamber is located in the furnace cabinet; the pusher mechanism, buffer rack, and manipulator are located in the purification platform; the transmission mechanism is connected to the purification platform. Taiwan and inserting chip machine) refers to the vapor phase deposition method of plasma enhanced chemistry. In the PECVD surface coating process, the graphite boat is the carrier of the solar cell, and the silicon wafer is processed into a solar cell after several processes, and the surface coating is one of the core processes of the solar cell processing. The graphite boat is the carrier of t...

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