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The loading and unloading method of PECVD surface coating based on coating detection

A surface coating and coating technology, which is used in gaseous chemical plating, metal material coating process, semiconductor/solid-state device testing/measurement, etc. Production efficiency, cell quality and other issues, to achieve the effect of smooth production process, safety and no touch, and stable efficiency

Active Publication Date: 2021-12-24
HUNAN RED SUN PHOTOELECTRICITY SCI & TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, these two methods are for single-piece detection in the inserting machine, which can detect whether the single piece is fragmented or cracked before entering the graphite boat, and whether the coating thickness and uniformity meet the requirements before entering the next process flower basket after coating. and other inspections, but none of them have tested whether the silicon wafer in the graphite boat is coated or not.
Therefore, it is easy to have repeated coating on the whole boat or no coating on the whole boat, which will affect the production efficiency of the whole line and the quality of the cells

Method used

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  • The loading and unloading method of PECVD surface coating based on coating detection
  • The loading and unloading method of PECVD surface coating based on coating detection
  • The loading and unloading method of PECVD surface coating based on coating detection

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Embodiment Construction

[0048] The present invention will be described in further detail below in conjunction with the accompanying drawings and specific embodiments.

[0049] Such as figure 1 and figure 2 As shown, the loading and unloading method of the PECVD surface coating based on the coating detection of the present embodiment includes the following steps:

[0050] S1. The graphite boat is in place: the graphite boat 1 inserted by the inserting and unloading machine moves to the bottom of the PECVD purification table through the conveying mechanism. The chip machine inserts the silicon chip into the graphite boat 1;

[0051] S2. Cache shelf on the graphite boat: the manipulator grabs the graphite boat 1 and puts it on the cache shelf 2 of the clean bench to wait;

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Abstract

The invention discloses a PECVD surface coating loading and unloading method based on coating detection, including graphite boat in place, graphite boat upper buffer rack, coating detection before entering the boat, graphite boat entering the reaction chamber, graphite boat exiting the reaction chamber, and sheet taking Pre-coating inspection, graphite boat returning to the insertion and removal machine and other steps. In the present invention, a device for detecting whether the graphite boat is coated or not is installed on the buffer rack, and two steps of whether the coating is detected are added. One is that the manipulator directly grabs the graphite boat without coating on the buffer rack according to the detection result and puts it into the boat pushing mechanism. Then it is sent into the reaction chamber for coating by the push boat mechanism, which can avoid secondary coating in the reaction chamber. The second is that the manipulator grabs the coated graphite boat on the buffer rack according to the test results and puts it on the transmission mechanism, which is sent into the insertion mechanism by the transmission mechanism. The slicer takes slices to prevent uncoated silicon wafers from flowing into the next process, to ensure that each boat of silicon wafers is fully coated, and there is no repeated coating, ensuring a smooth production process.

Description

technical field [0001] The invention relates to a PECVD surface coating process, in particular to a method for loading and unloading PECVD surface coatings based on coating detection. Background technique [0002] PECVD (Plasma Enhanced Chemical Vapor Deposition, PECVD equipment includes three parts, namely gas source cabinet, furnace cabinet and purification platform, the reaction chamber is located in the furnace cabinet; the pusher mechanism, buffer rack, and manipulator are located in the purification platform; the transmission mechanism is connected to the purification platform. Taiwan and inserting chip machine) refers to the vapor phase deposition method of plasma enhanced chemistry. In the PECVD surface coating process, the graphite boat is the carrier of the solar cell, and the silicon wafer is processed into a solar cell after several processes, and the surface coating is one of the core processes of the solar cell processing. The graphite boat is the carrier of t...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L31/18H01L21/66H01L21/677C23C16/50C23C16/52C23C16/54
CPCH01L31/1804H01L31/1876H01L22/12H01L22/20H01L21/67739H01L21/67742C23C16/50C23C16/54C23C16/52Y02P70/50
Inventor 朱辉成秋云黄心沿刘帅肖洁吴得轶
Owner HUNAN RED SUN PHOTOELECTRICITY SCI & TECH
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