The invention discloses a feeding and discharging method for PECVD surface coating. The feeding and discharging method comprises the steps of graphite boat positioning, feeding a graphite boat to a buffer frame, pushing the graphite boat onto a boat pushing mechanism, coating detection before boat feeding, feeding the graphite boat into a reaction chamber, discharging the graphite boat out of thereaction chamber, feeding the graphite boat on a conveying mechanism, coating detection before sheet taking, returning the graphite boat to a sheet inserting and taking machine and the like. Accordingto the invention, two coating detection steps are added on an inevitable path of the graphite boat; namely, firstly, a boat pushing detection mechanism detects whether a silicon wafer in a graphite boat which is about to enter a reaction chamber is coated or not, secondary coating in the reaction chamber is avoided; and secondly, whether the silicon wafer to enter the wafer inserting and taking machine on the conveying mechanism is coated or not is detected, and the silicon wafers which are not coated are prevented from flowing into the next process, so that each boat of silicon wafers are coated, repeated coating is avoided, the smoothness of a production process is guaranteed, the efficiency of the silicon wafers is more stable, and the quality of battery pieces is improved.