Compound, photoresist composition comprising same, photoresist pattern comprising same, and method for manufacturing photoresist pattern
A compound and chemical formula technology, applied in the field of pattern preparation, can solve the problems of sensitivity reduction and line width roughness, etc., and achieve the effect of improving line width roughness, resolution freedom, and high resolution
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[0207] Hereinafter, the specification will be described in detail with reference to the embodiments to specifically describe the specification. However, the embodiments according to the present specification can be modified into various other forms, and the scope of the present specification should not be construed as being limited to the embodiments described below. The embodiments of this specification are provided to more fully describe this specification to those skilled in the art.
preparation example 1
[0209] Preparation Example 1-
[0210]
[0211] Cyclopentadiene (132.2g, 2.0mol), 2-carboxyethyl acrylate (130.1g, 1.0mol) and 4-methoxyphenol (2.4g, 0.02mol) were introduced into the high-pressure reactor, and the resultant was Reacted at 180°C for 18 hours, and then vacuum distilled to obtain compound 1 (190 g, 97%).
[0212] Introduce compound 1 (196g, 1.0mol), 1,1-difluoro-2-hydroxyethane-1-sodium sulfonate (220.9g, 1.2mol) and H 2 SO 4 (19.6 g, 0.2 mol) and reacted at 60° C. for 6 hours. After the reaction is complete, introduce H into it 2 O (1 L), the resultant was extracted 3 times with ethyl acetate (1 L), and the solvent was removed. The obtained resultant was recrystallized from ethanol (EtOH) to obtain Compound 2 (330 g, 91%).
[0213] Compound 2 (181 g, 0.5 mol) and triphenylsulfonium bromide (172 g, 0.5 mol) were introduced into H 2 O:dichloromethane=1:1 solution (1L), and reacted at room temperature (25°C) for 12 hours. After the reaction was complete,...
preparation example 2
[0216] Preparation Example 2-
[0217]
[0218] After fumaric acid (117 g, 1 mol) was appropriately dissolved in tetrahydrofuran (THF), cyclopentadiene (198 g, 3 mol) was injected thereinto using a dropping funnel at 0° C. for 30 minutes, and the resultant was Stir at room temperature for 12 hours. Residual cyclopentadiene was removed by vacuum distillation to obtain compound 4 (173 g, 95%).
[0219] Compound 4 (164g, 0.9mol), sodium 1,1-difluoro-2-hydroxyethane-1-sulfonate (166g, 0.9mol) and sulfuric acid (19g, 0.18mol) were introduced and stirred at 60°C for 6 hours . After the reaction was completed, the layers were separated using ethyl acetate, and the solvent was evaporated to obtain the product. The obtained product was dissolved in ethanol to recrystallize, thus, Compound 5 (298 g, 95%) was obtained.
[0220] Dichloromethane (1050 mL), 2-methyl-2-adamantanol (50 g, 0.3 mol) and triethylamine (TEA) (67 g, 0.66 mol) were introduced into the flask and stirred. Use...
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