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Film material for electronic products and preparation method thereof

A technology for thin-film materials and electronic products, applied in coatings and other directions, can solve problems such as difficulty in having stability, and achieve the effects of simple and fast preparation methods, improved durability, and improved UV oxidation resistance.

Pending Publication Date: 2020-11-03
宋鑫
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

This type of film material has certain insulation and anti-oxidation effects on air and moisture, but it is difficult to have high stability under ultraviolet radiation. Therefore, it is very necessary to prepare a film material that can resist ultraviolet oxidation.

Method used

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  • Film material for electronic products and preparation method thereof
  • Film material for electronic products and preparation method thereof

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Experimental program
Comparison scheme
Effect test

Embodiment 1

[0035] The present invention provides a method for preparing a film material for electronic products including the following steps:

[0036] (1) Prepare the substrate: ultrasonically clean the transparent film substrate in water, acetone, and ethanol for 10 minutes, and dry and treat with ultraviolet ozone for 10 minutes, and then use it for later use;

[0037] (2) Preparation of coating liquid:

[0038] a) Secondary reducing agent solution: the secondary reducing agent is dissolved in an aqueous solution with an ethanol content of 40 wt% at a concentration of 0.5 mg / mL;

[0039] b) Silver nanowire ink: obtained by dispersing silver nanowires in ethanol at a concentration of 1 mg / mL;

[0040] c) Primary reducing agent solution: the primary reducing agent is dissolved in an aqueous solution with an ethanol content of 40% by weight at a concentration of 5mmol / L; the primary reducing agent is a ferrous ion salt;

[0041] d) UV curing solution: the polyurethane resin is dissolved in a polar ...

Embodiment 2

[0046] The present invention provides a method for preparing a film material for electronic products including the following steps:

[0047] (1) Prepare the substrate: ultrasonically clean the transparent film substrate in water, acetone, and ethanol for 20 minutes, dry and treat with ultraviolet ozone for 30 minutes, and use it for later use;

[0048] (2) Preparation of coating liquid:

[0049] a) Secondary reducing agent solution: the secondary reducing agent is dissolved in an aqueous solution with an ethanol content of 80% by weight at a concentration of 2 mg / mL;

[0050] b) Silver nanowire ink: Disperse silver nanowires in ethanol at a concentration of 6mg / mL to obtain;

[0051] c) Primary reducing agent solution: the primary reducing agent is dissolved in an aqueous solution with an ethanol content of 80% by weight at a concentration of 20 mmol / L; the primary reducing agent is a ferrous ion salt;

[0052] d) UV curing liquid: the polyurethane resin is dissolved in a polar organic s...

Embodiment 3

[0057] The present invention provides a method for preparing a film material for electronic products including the following steps:

[0058] (1) Prepare the substrate: ultrasonically clean the transparent film substrate in water, acetone, and ethanol for 15 minutes, then dry it and treat it with ultraviolet ozone for 20 minutes, and then set it aside;

[0059] (2) Preparation of coating liquid:

[0060] a) Secondary reducing agent solution: the secondary reducing agent is dissolved in an aqueous solution with an ethanol content of 70% by weight at a concentration of 1 mg / mL;

[0061] b) Silver nanowire ink: the silver nanowire is dispersed in ethanol at a concentration of 5mg / mL;

[0062] c) Primary reducing agent solution: the primary reducing agent is dissolved in an aqueous solution with an ethanol content of 70% by weight at a concentration of 10 mmol / L; the primary reducing agent is a ferrous ion salt;

[0063] d) UV curing solution: the polyurethane resin is dissolved in a polar or...

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Abstract

The invention discloses a preparation method of a film material for an electronic product. The preparation method comprises the following steps: (1) preparing a substrate; (2) preparing a coating liquid: a) a secondary reducing agent solution; b) silver nanowire ink; c) a primary reducing agent solution; and d) UV curing liquid; and (3) preparing a thin film: sequentially coating the secondary reducing agent solution, the silver nanowire film water, the primary reducing agent solution and the UV curing liquid on a substrate, wherein the present layer is coated and dried before the coating of the next layer, and then completing the coating of all the coating liquids and drying to obtain the thin film material for the electronic product. The preparation method disclosed by the invention is simple and rapid, and the preparation of the film material with excellent ultraviolet oxidation resistance for the electronic product can be realized at a relatively low cost. The invention also provides a thin film material for electronic products, which is prepared by the method, the block resistance and light transmittance of the thin film are kept unchanged under the irradiation of ultravioletrays for 3 hours, and the change rate of the thin film after being irradiated for 100 hours does not exceed 4%.

Description

Technical field [0001] The invention relates to the field of transparent conductive films, in particular to a film material for electronic products and a preparation method thereof. Background technique [0002] Transparent conductive film is a film that can conduct electricity and has high visible light transmittance. It has broad applications in OLEDs, solar cells, heating devices, photonic and optoelectronic equipment, electromagnetic shielding equipment, and flexible wearable devices. At present, commercial transparent conductive films are mainly made of ITO, but the limited and expensive indium reserves, and the film is not suitable for bending, limit its application range. Silver nanowire transparent conductive films have obvious advantages in this respect and are expected to replace ITO. However, silver nanowires, as nano-metal materials, are easily oxidized by oxygen in the air and ultraviolet rays. In the existing technology, some related personnel have done research to ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C08J7/04C08J7/044C08J7/06C08L67/02
CPCC08J7/06C08J2367/02C08J2475/04C08J7/0423C08J7/044
Inventor 宋鑫
Owner 宋鑫