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High-refractive-index photosensitive resin and preparation method thereof

A technology of photosensitive resin and high refractive index, applied in the field of photosensitive resin, can solve the problem of low refractive index and achieve the effect of high hardness, low price and good chemical resistance

Active Publication Date: 2020-11-17
安徽富印新材料股份有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] The purpose of the present invention is to provide a high refractive index photosensitive resin and its preparation method, aiming to solve the technical problem that the refractive index of the photosensitive resin in the prior art is relatively low

Method used

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  • High-refractive-index photosensitive resin and preparation method thereof
  • High-refractive-index photosensitive resin and preparation method thereof
  • High-refractive-index photosensitive resin and preparation method thereof

Examples

Experimental program
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Embodiment 1

[0041] This embodiment provides a method for preparing the above-mentioned high refractive index photosensitive resin, which includes the following steps:

[0042] 1) The reactive diluent is subjected to 4.2 hours of reduced pressure and vacuum treatment at a temperature of 78°C.

[0043] 2) After 3-glycidylpropyltrimethoxysilane and titanium dioxide nanoparticles are mixed at a molar ratio of 1:2.5, they are ultrasonically dispersed for 3 hours to obtain modified inorganic nanoparticles.

[0044] 3) Add the proportioned epoxy bisphenol fluorene and solvent into the reaction kettle, turn on the stirring, heat up to 102° C., and stir until the epoxy bisphenol fluorene is completely dissolved.

[0045] 4) Mix the proportioned amount of acrylic acid, catalyst and polymerization inhibitor to obtain a mixture. The mixture is added into the reaction kettle three times within 25 minutes, reacted for 7 hours, and then discharged. Add proportioned amount of modified inorganic nanoparticles and ...

Embodiment 2

[0047] This embodiment provides a method for preparing the above-mentioned high refractive index photosensitive resin, which includes the following steps:

[0048] 1) The active diluent is subjected to vacuum treatment under reduced pressure for 4 hours at a temperature of 80°C.

[0049] 2) After mixing 3-(methacryloxy)propyltrimethoxysilane and silica nanoparticles at a molar ratio of 1:3, ultrasonically dispersing for 2 hours to obtain modified inorganic nanoparticles.

[0050] 3) Add the proportioned epoxy bisphenol fluorene and solvent into the reaction kettle, turn on the stirring, heat up to 105° C., and stir until the epoxy bisphenol fluorene is completely dissolved.

[0051] 4) Mix the proportion of acrylic acid, catalyst and polymerization inhibitor to obtain a mixture. The mixture is added into the reaction kettle 4 times within 30 minutes, reacted for 6.5 hours, discharged, and added the proportion of modified inorganic nanoparticles and activity The diluent and the photoin...

Embodiment 3

[0053] This embodiment provides a method for preparing the above-mentioned high refractive index photosensitive resin, which includes the following steps:

[0054] 1) The active diluent is subjected to vacuum treatment under reduced pressure for 3.8 hours at a temperature of 82°C.

[0055] 2) After mixing 3-(acryloxypropyl)trimethoxysilane and zirconia nanoparticles at a molar ratio of 1:5, ultrasonically dispersing for 1 hour to obtain modified inorganic nanoparticles.

[0056] 3) Add the proportioned epoxy bisphenol fluorene and solvent into the reaction kettle, turn on the stirring, heat up to 108° C., and stir until the epoxy bisphenol fluorene is completely dissolved.

[0057] 4) Mix the proportioned amount of acrylic acid, catalyst and polymerization inhibitor to obtain a mixture. The mixture is added to the reactor in 5 times within 35 minutes, reacted for 6 hours, discharged, and added the proportioned amount of modified inorganic nanoparticles and activity The diluent and the...

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Abstract

The invention discloses photosensitive resin with a high refractive index. The photosensitive resin comprises the following raw materials in parts by weight: 74-79 parts of epoxy bisphenol fluorene; 23 to 24.5 parts of acrylic acid; 41 to 45 parts of a solvent; 0.4 to 0.6 part of a catalyst; 0.05 to 0.25 part of a polymerization inhibitor; and 2.5 to 6 parts of a photoinitiator. According to the high-refractive-index photosensitive resin, a benzene ring is introduced through the epoxy bisphenol fluorene, so that the refractive index is improved; the high-refractive-index photosensitive resin has the advantages of high transparency, low linear expansion coefficient and the like. A preparation method of the high-refractive-index photosensitive resin comprises the following steps: 1) adding the epoxy bisphenol fluorene and the solvent into a reaction kettle according to a ratio, starting stirring, heating to 102-108 DEG C, and stirring until the epoxy bisphenol fluorene is completely dissolved; and 2) mixing the acrylic acid, the catalyst and the polymerization inhibitor in proportion to obtain a mixture, adding the mixture into the reaction kettle in 3-5 times within 25-35 minutes, reacting for 6-7 hours, discharging, adding modified inorganic nanoparticles, an active diluent and the photoinitiator in proportion, and uniformly stirring to obtain the high-refractive-index photosensitive resin.

Description

Technical field [0001] The invention belongs to the technical field of photosensitive resins, and particularly relates to a high refractive index photosensitive resin and a preparation method thereof. Background technique [0002] Now the optical films made of photosensitive resin produced in the factory are widely used in modern optics and optoelectronic technology fields including laser systems, optical communications, optical displays, and optical storage to manufacture various optical instruments. Its main optical thin film devices include reflective films, anti-reflection films, polarizing films, brightness enhancing films, interference filters, beam splitters, camera lenses and high-end glasses lenses, as well as high-end automotive paints and paints. They have played a huge role in national economic development and national defense construction. [0003] Liquid photosensitive resin is what we call the material used for light curing rapid prototyping. After scientific resea...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C08F22/20C08F2/48C08F2/44C08K9/06C08K3/22C08K3/36
CPCC08F22/20C08F2/48C08F2/44C08K9/06C08K3/22C08K3/36C08K2201/011C08K2003/2241C08K2003/2244
Inventor 岳刚
Owner 安徽富印新材料股份有限公司
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