A kind of high refractive index photosensitive resin and preparation method thereof

A technology of photosensitive resin and high refractive index, applied in the field of photosensitive resin, can solve the problems of low refractive index and achieve high transparency, low price and good chemical resistance

Active Publication Date: 2022-07-01
安徽富印新材料股份有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] The purpose of the present invention is to provide a high refractive index photosensitive resin and its preparation method, aiming to solve the technical problem that the refractive index of the photosensitive resin in the prior art is relatively low

Method used

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  • A kind of high refractive index photosensitive resin and preparation method thereof
  • A kind of high refractive index photosensitive resin and preparation method thereof
  • A kind of high refractive index photosensitive resin and preparation method thereof

Examples

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Embodiment 1

[0041] The present embodiment provides the preparation method of the above-mentioned high refractive index photosensitive resin, comprising the following steps:

[0042] 1) Under the condition that the temperature is 78°C, the reactive diluent is subjected to reduced pressure and vacuum treatment for 4.2 hours.

[0043] 2) After mixing 3-glycidylpropyltrimethoxysilane and titanium dioxide nanoparticles in a molar ratio of 1:2.5, ultrasonically dispersed for 3 hours to obtain modified inorganic nanoparticles.

[0044] 3) Add the proportion of epoxy bisphenol fluorene and solvent into the reaction kettle, turn on stirring, heat up to 102°C, and stir until the epoxy bisphenol fluorene is completely dissolved.

[0045] 4) The acrylic acid, the catalyst and the polymerization inhibitor of the proportioning amount are mixed to obtain a mixture, and the mixture is added to the reactor in 3 times within 25 minutes, reacted for 7 hours, discharged, and the modified inorganic nanopartic...

Embodiment 2

[0047] The present embodiment provides the preparation method of the above-mentioned high refractive index photosensitive resin, comprising the following steps:

[0048] 1) Under the condition that the temperature is 80°C, the reactive diluent is subjected to reduced pressure and vacuum treatment for 4 hours.

[0049] 2) After mixing 3-(methacryloyloxy)propyltrimethoxysilane and silica nanoparticles in a molar ratio of 1:3, ultrasonically dispersing for 2 hours to obtain modified inorganic nanoparticles.

[0050] 3) Add the epoxy bisphenol fluorene and the solvent in proportion to the reaction kettle, turn on stirring, heat up to 105°C, and stir until the epoxy bisphenol fluorene is completely dissolved.

[0051] 4) The acrylic acid, the catalyst and the polymerization inhibitor of the proportioning amount are mixed to obtain a mixture, and the mixture is added to the reactor in 4 times within 30 minutes, and the reaction is carried out for 6.5 hours. The diluent and the phot...

Embodiment 3

[0053] The present embodiment provides the preparation method of the above-mentioned high refractive index photosensitive resin, comprising the following steps:

[0054] 1) Under the condition that the temperature is 82°C, the reactive diluent is subjected to reduced pressure and vacuum treatment for 3.8 hours.

[0055] 2) After mixing 3-(acryloyloxypropyl)trimethoxysilane and zirconia nanoparticles at a molar ratio of 1:5, ultrasonically dispersing for 1 hour to obtain modified inorganic nanoparticles.

[0056] 3) Add the epoxy bisphenol fluorene and the solvent in proportion to the reaction kettle, turn on and stir, heat up to 108° C., and stir until the epoxy bisphenol fluorene is completely dissolved.

[0057] 4) The acrylic acid, the catalyst and the polymerization inhibitor of the proportioning amount are mixed to obtain a mixture, and the mixture is added into the reactor in 5 times within 35 minutes, reacted for 6 hours, discharged, and the modified inorganic nanoparticl...

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Abstract

The invention discloses a high refractive index photosensitive resin, comprising the following raw materials: 74-79 parts by weight of epoxy bisphenol fluorene; 23-24.5 parts by weight of acrylic acid; 41-45 parts by weight of solvent; Catalyst; 0.05-0.25 parts by weight of a polymerization inhibitor and 2.5-6 parts by weight of a photoinitiator. The high-refractive-index photosensitive resin improves its refractive index by introducing epoxy bisphenol fluorene into a benzene ring; the high-refractive-index photosensitive resin has the advantages of high transparency, low linear expansion coefficient and the like. The preparation method of the high-refractive-index photosensitive resin comprises the following steps: 1) adding the epoxy bisphenol fluorene and the solvent in proportion to the reaction kettle, turning on and stirring, heating up to 102-108° C., and stirring until the epoxy bisphenol fluorene Dissolve completely; 2) mix the acrylic acid, catalyst and polymerization inhibitor of the proportioning amount to obtain a mixture, the mixture is added in the reaction kettle in 3 to 5 times within 25 to 35 minutes, react for 6 to 7 hours, discharge, and add the proportioning amount of modified inorganic nanoparticles, active diluent and photoinitiator, and stir evenly to prepare a high refractive index photosensitive resin.

Description

technical field [0001] The invention belongs to the technical field of photosensitive resins, and in particular relates to a high refractive index photosensitive resin and a preparation method thereof. Background technique [0002] Now the optical film made of photosensitive resin produced in the factory is widely used in modern optical and optoelectronic technology fields including laser system, optical communication, optical display, optical storage, etc., to manufacture various optical instruments. Its main optical thin film devices include reflective films, anti-reflection films, polarizing films, brightness enhancement films, interference filters, beam splitters, camera lenses and high-end spectacle lenses, as well as high-end coatings and paints for automobiles. They have played a huge role in national economic development and national defense construction. [0003] Liquid photosensitive resin is what we call the material used for light curing rapid prototyping. Afte...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C08F22/20C08F2/48C08F2/44C08K9/06C08K3/22C08K3/36
CPCC08F22/20C08F2/48C08F2/44C08K9/06C08K3/22C08K3/36C08K2201/011C08K2003/2241C08K2003/2244
Inventor 岳刚
Owner 安徽富印新材料股份有限公司
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