Liquid-phase micro-nano processing method and equipment

Abstract

The invention provides a liquid-phase micro-nano processing method and equipment. The equipment combines with a liquid-phase nano processing method, and achieves the graphical processing of a nano film, the processing of a solid nano hole and the nano 3D printing on the micro-nano processing equipment based on a nano glass micro-tube. A quartz tuning fork is adopted to control a nano glass micro-tube to be in direct contact with a nano film for processing, and a bias voltage or current setting mode is adopted to process the nano film. According to the liquid-phase micro-nano processing methodand equipment, multiple kinds of work such as nano graph equipment, nano hole or nano hole array equipment and 3D nano printing can be achieved on the same platform, subtractive manufacturing is achieved, additive manufacturing is also achieved, and the equipment complexity, especially the nanoscale equipment complexity, can be greatly improved.

Description

technical field [0001] The invention belongs to the technical field of micro-nano processing, and relates to a liquid-phase micro-nano processing method and equipment, which can prepare various shapes and patterns on various types of film substrates. Background technique [0002] Since the development of integrated circuit technology, micro-nano processing technology has been the core technology that major companies in various countries have strived to break through and improve, and it is also the core competitiveness of science and technology among countries. Lithography equipment is the core equipment in the field of micro-nano processing, which directly determines the ability to produce devices, which in turn affects the long-term development of a country's comprehensive national strength. At present, there are two main forms of photolithography, including microlithography and micro-nanofabrication, or photomask manufacturing and electron beam lithography. [0003] The u...

AI Technical Summary

Problems solved by technology

However, both of these are capital-intensive micro-nano processing methods, and their processing accuracy is greatly affected by ambient temperature, photoresist performance, etc., and the development cycle of the complete machine equipment is relatively long

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