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A kind of high moisturizing and nourishing facial mask and preparation method thereof

A technology of facial mask and moisturizing agent, which is applied in pharmaceutical formulations, cosmetic preparations, cosmetic preparations, etc., can solve the problems of discount of facial mask effect, increased production cost, ineffective penetration, etc., and achieves strong permeability and improved skin feel. , the effect of protecting the cortex

Active Publication Date: 2021-03-30
JIANGSU YUANHENG PHARMA
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Patent document CN 111037804A discloses a method for preparing a facial mask without preservatives and antiseptic substitutes. The invention uses high-temperature steam to sterilize the fermentation supernatant to ensure aseptic cleanliness when filling the facial mask. , mask paper, and mask filling machines are all sterilized to achieve the effect of extending the shelf life of the mask without adding preservatives and antiseptic substitutes, but this method also requires high equipment, which undoubtedly increases production costs. The mask liquid only plays the role of hydrating the cuticle, and cannot effectively penetrate into the cuticle of the skin, but achieves the effect of long-term moisturizing and instant nourishing of the skin, and the effect of the mask is greatly reduced

Method used

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  • A kind of high moisturizing and nourishing facial mask and preparation method thereof
  • A kind of high moisturizing and nourishing facial mask and preparation method thereof
  • A kind of high moisturizing and nourishing facial mask and preparation method thereof

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Experimental program
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Effect test

Embodiment 1

[0033] Embodiment 1 A kind of high moisturizing and nourishing facial mask

[0034] A high moisturizing and nourishing facial mask, comprising a mask liquid and a mask cloth, the mask liquid includes the following components in parts by weight: 5.5 parts of the first moisturizing agent, 6 parts of the second moisturizing agent, 3.5 parts of the first skin conditioning agent, 2. 8.8 parts of skin conditioner, 0.05 part of pH regulator, 1.0 part of emollient, 2.5 parts of PEG-400 complex and 100 parts of pure water;

[0035] The first moisturizing agent is composed of trehalose, dipropylene glycol, glycerin, betaine and 1,2 hexanediol in a ratio of parts by weight of 1:0.1:0.1:0.3:0.3; the second moisturizing agent is composed of Composition of white fungus (TREMELLA FUCIFORMIS) polysaccharide, sodium hyaluronate and hydrolyzed sodium hyaluronate, glycerol-26, methyl gluceth-20 with a ratio of 1:0.2:0.2:0.1:0.1;

[0036] The first skin conditioning agent is composed of rose (RO...

Embodiment 2

[0047] Embodiment 2 A kind of high moisturizing and nourishing mask

[0048] A high-moisturizing nourishing facial mask, comprising a facial mask liquid and a facial mask cloth, the facial mask liquid includes the following components in parts by weight: 8.5 parts of the first moisturizing agent, 8.6 parts of the second moisturizing agent, 7.2 parts of the first skin conditioning agent, and 8.6 parts of the second moisturizing agent 2. 7.2 parts of skin conditioning agent, 0.6 part of pH regulator, 1.3 parts of emollient, 90 parts of PEG-400 complex and pure water.

[0049] The first moisturizing agent is composed of trehalose, dipropylene glycol, glycerin, betaine and 1,2 hexanediol in a ratio of parts by weight of 1:0.2:0.2:0.5:0.5; the second moisturizing agent Composed of white fungus (TREMELLA FUCIFORMIS) polysaccharide, sodium hyaluronate and hydrolyzed sodium hyaluronate, glycerol polyether-26, methyl gluceth-20 with a ratio of parts by weight of 1:0.35:0.5:0.35:0.3 ; ...

Embodiment 3

[0061] Embodiment 3 A kind of high moisturizing and nourishing mask

[0062] A high moisturizing and nourishing facial mask, comprising a facial mask liquid and a facial mask cloth, the facial mask liquid includes the following components in parts by weight: 10.6 parts of the first moisturizing agent, 10.6 parts of the second moisturizing agent, 8.8 parts of the first skin conditioner, and 8.8 parts of the second moisturizing agent. 2. 3.5 parts of skin conditioning agent, 1 part of pH regulator, 2.3 parts of emollient, 2.6 parts of PEG-400 complex and 80 parts of pure water.

[0063] The first moisturizing agent is composed of trehalose, dipropylene glycol, glycerin, betaine and 1,2 hexanediol in a ratio of parts by weight of 1:0.1:0.5:0.3:0.6; the second moisturizing agent Tremella fuciformis (TREMELLA FUCIFORMIS) polysaccharide, sodium hyaluronate and hydrolyzed sodium hyaluronate, glycerol polyether-26, methyl gluceth- 20 composition;

[0064] The first skin conditioning...

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Abstract

The invention belongs to the technical field of cosmetics, and particularly relates to a high-moisturizing nourishing mask and a preparation method thereof. Mask liquid comprises various nourishing components such as a first humectant, a second humectant, a first skin conditioner, a second skin conditioner, a pH regulator, an emollient and the PEG-400 complex, can effectively permeate and directlyreach dermis tissue, rapidly improves drying, achieves the effects of continuous long-acting moisture preservation and instant moisture preservation, can effectively whiten and resist aging, and is simple in preparation process and controllable in quality.

Description

technical field [0001] The invention relates to the technical field of daily cosmetics, in particular to a high moisturizing and nourishing facial mask and a preparation method thereof. Background technique [0002] The function of the mask is to use the short time covered on the face to temporarily isolate the outside air and pollution, increase the temperature of the skin, expand the pores of the skin, promote the secretion and metabolism of sweat glands, increase the oxygen content of the skin, and help the skin to eliminate epidermal cells. The products of metabolism and accumulated oily substances, the moisture in the mask penetrates into the stratum corneum of the epidermis, the skin becomes soft, and the skin is naturally bright and elastic. With the development of the economy, the mask market has become one of the fastest growing market segments in my country's daily chemical industry, which can simultaneously solve various skin problems such as moisturizing, whiteni...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): A61K8/9794A61K8/9789A61K8/99A61K8/60A61K8/34A61K8/44A61K8/73A61K8/86A61K8/67A61K8/64A61K8/68A61K8/49A61K8/81A61Q19/00A61Q19/02A61Q19/08
CPCA61K8/345A61K8/44A61K8/4953A61K8/60A61K8/64A61K8/675A61K8/68A61K8/73A61K8/735A61K8/8176A61K8/86A61K8/99A61K2800/5922A61K2800/82A61Q19/00A61Q19/007A61Q19/02A61Q19/08A61K8/9789A61K8/9794
Inventor 吕国强贾瑞巧何井亮戴丽萍徐灿灿
Owner JIANGSU YUANHENG PHARMA
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