Integrated photoelectric detection device based on disc metasurface structure narrow-band filtering
A narrowband filtering and photoelectric detection technology, applied in the field of photodetectors, can solve the problems of peak width at half maximum, high loss, low transmittance, etc., to reduce the impact and achieve the effect of hyperspectral narrowband spectral detection
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Embodiment 1
[0026] An integrated photodetector device based on disc metasurface structure narrow-band filtering, such as Figure 1-4 As shown, the structure of the detector is as follows from bottom to top: bottom to top: bottom electrode structure 1, semiconductor layer 2, metal thin film layer 3, dielectric layer 4 and top metal disc structure 5.
[0027] Wherein the bottom electrode structure 1 is a bottom silver electrode structure prepared by thermal evaporation, with a thickness of 100 nm;
[0028] The semiconductor layer 2 is a PN type semiconductor layer prepared by PECVD, with a thickness of 1500nm;
[0029] Metal thin film layer 3 is a silver thin film layer prepared by thermal evaporation, with a thickness of 20nm;
[0030] The dielectric layer 4 adopts a silicon dioxide dielectric layer prepared by PECVD; the thickness is 150nm
[0031] The metal disk structure 5 is a silver disk structure prepared by thermal evaporation; the thickness is 20nm, the period is 600nm, and the d...
Embodiment 2
[0035] An integrated photodetector device based on disc metasurface structure narrow-band filtering, such as Figure 1-4 As shown, the structure of the detector is as follows from bottom to top: the structure of the detector from bottom to top is as follows: from bottom to top: bottom electrode structure 1, semiconductor layer 2, metal thin film layer 3, dielectric layer 4 And the metal disc structure 5 on the top.
[0036] Wherein the bottom electrode structure 1 is a bottom gold electrode structure prepared by thermal evaporation, with a thickness of 100 nm;
[0037] The semiconductor layer 2 is an indium gallium arsenide semiconductor layer with a thickness of 1500 nm;
[0038] The metal thin film layer 3 adopts a gold thin film layer prepared by thermal evaporation, and the thickness is 15nm;
[0039] The dielectric layer 4 is a silicon nitride dielectric layer prepared by PECVD; the thickness is 100nm
[0040] The metal disk structure 5 is a gold disk structure prepare...
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