Broadband and wide-angle perfect absorber based on mxene and its preparation method
A perfect absorption, wide-angle technology, applied in the field of optical materials, can solve the problems of low flux, expensive technology, hindering the wide application of devices, etc., to achieve the effect of easy regulation, lower production cost, and simple and fast preparation method
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Embodiment 1
[0033] This embodiment provides a MXENE-based wideband and wide-angle perfect absorbent, which is schematically shown figure 1 As shown in SiO 2 The multilayer structure on / Si substrate 1, the multilayer structure from the bottom to top, and the MXENE backplane layer 2, the PMMA spacer layer 3, and the gold nanoparticle layer 4 are sequentially.
[0034] Among them, the thickness of the MXENE backplane layer 2 is 180 nm, the thickness of the PMMA spacer layer 3 is 40 nm, and the gold nanoparticle layer 4 is a single layer randomly arranged gold nanoparticle, the size of the gold nanoparticle is different, the particle size range is 20- 100 nm, the golden nanoparticle layer 4 covers the coverage of the PMMA spacer layer 3 of 75%.
[0035] This embodiment also provides the preparation method of the above-mentioned perfect absorber, steps below:
[0036] (1) Preparation of in situ etching MXENE
[0037] The HCl + LIF solution was configured: 1.0 g of LiF and 20 ml of HCl (6 m) were...
Embodiment 2
[0051] This embodiment provides a MXENE-based wideband and wide-angle perfect absorbent, and the difference from Example 1 is only that the thickness of the MXENE backplane layer is 144 nm.
[0052] The absorption of the absorber is measured under the same conditions. Figure 8 Indicated.
Embodiment 3
[0054] This embodiment provides a MXENE-based wideband and wide-angle perfect absorbent body, and the difference from Example 1 is only that the thickness of the PMMA spacer layer is 72 nm.
[0055] The absorption of the absorber is measured under the same conditions. Figure 9 Indicated.
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