Nitrogen-doped p-type transparent conductive beznos thin film and its preparation method and application

A transparent conductive, nitrogen-doped technology, applied in metal material coating process, vacuum evaporation plating, coating and other directions, can solve the problems of low solubility, low N solubility, unstable acceptor, etc., and achieve equipment and operation technology. Simple, improve stability, improve the effect of solid solubility

Active Publication Date: 2022-02-22
HUBEI UNIV +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0002] At present, the international reports that can be used as p-type ZnO doping elements include group V elements N, P, As, etc., and group I elements Li, Na, etc., among which Li ions have a small radius and are easy to occupy the lattice gap to form donor impurities. It is conducive to the realization of p-type conductivity. Among the group V elements, the size of N atoms is similar to that of O atoms, and the energy level of N acceptors in ZnO is shallow. It has always been considered as the most promising p-type dopant
However, due to the low solubility of N in ZnO and the o unstable, it is difficult to achieve stable p-type conduction
[0003] For the current N-doped ZnO N o It is necessary to improve the problem of unstable acceptor and low solubility of N

Method used

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  • Nitrogen-doped p-type transparent conductive beznos thin film and its preparation method and application
  • Nitrogen-doped p-type transparent conductive beznos thin film and its preparation method and application
  • Nitrogen-doped p-type transparent conductive beznos thin film and its preparation method and application

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Embodiment 1

[0033] The invention provides a method for preparing a nitrogen-doped p-type transparent conductive BeZnOS thin film, such as figure 1 shown, including the following steps:

[0034] S1. Preparation of BeZnOS ceramic targets;

[0035] S2. Provide a substrate, place the substrate in the vacuum cavity of the pulsed laser deposition system, pass nitrogen monoxide gas into the vacuum cavity, use the BeZnOS ceramic target material, and adopt the method of pulse laser ablation deposition Nitrogen-doped BeZnOS film growth on the substrate;

[0036] S3. Annealing the obtained nitrogen-doped BeZnOS thin film at a temperature of 400-750° C. in a nitrogen monoxide atmosphere to obtain a nitrogen-doped p-type transparent conductive BeZnOS thin film.

[0037] It should be noted that the preparation method of the BeZnOS ceramic target in the embodiment of the present application includes:

[0038] Weigh ZnS and BeO powders with a molar ratio of 94:6 in a ball mill jar, then add deionized ...

Embodiment 2

[0049] The invention provides a method for preparing a nitrogen-doped p-type transparent conductive BeZnOS thin film, comprising the following steps:

[0050] S1. Preparation of BeZnOS ceramic targets;

[0051] S2. Provide a substrate, place the substrate in the vacuum cavity of the pulsed laser deposition system, pass nitrogen monoxide gas into the vacuum cavity, use the BeZnOS ceramic target material, and adopt the method of pulse laser ablation deposition Nitrogen-doped BeZnOS film growth on the substrate;

[0052] S3. Annealing the obtained nitrogen-doped BeZnOS thin film at a temperature of 400-750° C. in a nitrogen monoxide atmosphere to obtain a nitrogen-doped p-type transparent conductive BeZnOS thin film.

[0053] It should be noted that the preparation method of the BeZnOS ceramic target in the embodiment of the present application includes:

[0054] Weigh ZnS and BeO powders with a molar ratio of 94:6 in a ball mill jar, then add deionized water with 70% of the to...

Embodiment 3

[0064] The invention provides a method for preparing a nitrogen-doped p-type transparent conductive BeZnOS thin film, comprising the following steps:

[0065] S1. Preparation of BeZnOS ceramic targets;

[0066] S2. Provide a substrate, place the substrate in the vacuum cavity of the pulsed laser deposition system, pass nitrogen monoxide gas into the vacuum cavity, use the BeZnOS ceramic target material, and adopt the method of pulse laser ablation deposition Nitrogen-doped BeZnOS film growth on the substrate;

[0067] S3. Annealing the obtained nitrogen-doped BeZnOS thin film at a temperature of 400-750° C. in a nitrogen monoxide atmosphere to obtain a nitrogen-doped p-type transparent conductive BeZnOS thin film.

[0068] It should be noted that the preparation method of the BeZnOS ceramic target in the embodiment of the present application includes:

[0069] Weigh ZnS and BeO powders with a molar ratio of 94:6 in a ball mill jar, then add deionized water with 60% of the to...

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Abstract

The invention provides a nitrogen-doped p-type transparent conductive BeZnOS film and its preparation method and application. The preparation method includes: preparing a BeZnOS ceramic target; providing a substrate, and placing the substrate in a vacuum chamber of a pulsed laser deposition system In the process, nitric oxide gas is introduced into the vacuum cavity, and the nitrogen-doped BeZnOS film is grown on the substrate by using the BeZnOS ceramic target material and the method of pulsed laser ablation deposition; the obtained nitrogen-doped BeZnOS The thin film is annealed at a temperature of 400-750° C. to obtain a nitrogen-doped p-type transparent conductive BeZnOS thin film. In the preparation method of the present invention, doping Be and S in ZnO to form a BeZnOS alloy can continuously adjust its energy band structure and electronic structure while maintaining the hexagonal structure of ZnO, more stable Be-N bonds and higher valence band tops Can reduce N o energy level, increasing N o stability.

Description

technical field [0001] The invention relates to the technical field of p-type transparent conductive thin films, in particular to a nitrogen-doped p-type transparent conductive BeZnOS thin film and its preparation method and application. Background technique [0002] At present, the international reports that can be used as p-type ZnO doping elements include group V elements N, P, As, etc., and group I elements Li, Na, etc., among which Li ions have a small radius and are easy to occupy the lattice gap to form donor impurities. It is conducive to the realization of p-type conductivity. Among the group V elements, the size of N atoms is similar to that of O atoms, and the N acceptor energy level in ZnO is relatively shallow. It has always been considered as the most promising p-type dopant. However, due to the low solubility of N in ZnO and the o unstable, it is difficult to achieve stable p-type conduction. [0003] For the current N-doped ZnO N o It is necessary to impro...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C14/06C23C14/28C23C14/58
CPCC23C14/0623C23C14/28C23C14/5806
Inventor 何云斌汪洋黎明锴李磊卢寅梅尹魏玲李派常钢陈俊年尹向阳郭启利李永昌
Owner HUBEI UNIV
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