A kind of silicon dioxide preparation method and prepared silicon dioxide
A silicon dioxide and silicon slag technology, applied in the direction of silicon dioxide, silicon oxide, etc., can solve the problems of waste of resources, pollution of the working environment, failure of normal sales and effective utilization, etc., to achieve the effect of increasing added value and ensuring purity
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[0049] The present invention provides a method for preparing silicon dioxide, comprising the following steps:
[0050] Step 1, the silicon slag is pulverized and then added to an acid solution for pickling to remove impurities in the silicon slag;
[0051] Step 2, adding the silicon slag after removing impurities into ultrapure water, heating to a target temperature, and stirring, and the target temperature is the temperature at which silicon and ultrapure water can be reacted to obtain xSiO 2 ·yH 2 O solution, where x>y;
[0052] Step 3, the xSiO 2 ·yH 2 O solution, wherein x>y, is placed in a container containing several grooves, and calcined at high temperature to obtain a high-purity silica product.
[0053] The present invention also provides a silica prepared by the above-mentioned method.
Embodiment 1
[0055] A method for preparing silicon dioxide of the present embodiment comprises the following steps:
[0056] Step 1, adding the pulverized silicon slag into an acid solution for pickling to remove impurities in the silicon slag;
[0057] Specifically, step 1 is divided into the following steps:
[0058] S100: Collect the silicon slag with a particle size of ≥10 meshes produced in the polysilicon production process, and then add the collected silicon slag into ultrapure water for ultrasonic cleaning. The ultrasonic cleaning time is 0.5h, and the cleaned silicon slag is pulverized. The particle size range of the crushed silicon slag is ≥200 mesh;
[0059] S101: Immerse the pulverized silicon slag in an acid solution for pickling to remove contaminants and impurities adhering to the surface of the silicon slag; in this embodiment, the acid solution is a mixed solution of nitric acid and hydrofluoric acid, and the The ratio is not required, just ensure that the pH of the mixe...
Embodiment 2
[0081] A method for preparing silicon dioxide of the present embodiment comprises the following steps:
[0082] Step 1, adding the pulverized silicon slag into an acid solution for pickling to remove impurities in the silicon slag;
[0083] Specifically, step 1 is divided into the following steps:
[0084] S100: Collect the silicon slag with a particle size of ≥10 meshes generated during the production of polysilicon, and then add the collected silicon slag into ultrapure water for ultrasonic cleaning. The ultrasonic cleaning time is 3 hours. The cleaned silicon slag is pulverized. After pulverization The particle size range of the silicon slag is ≥200 mesh;
[0085] S101: soak the pulverized silicon slag in an acid solution for pickling to remove pollutants and impurities adhering to the surface of the silicon slag; in this embodiment, the acid solution is a hydrofluoric acid solution, and the pH of the hydrofluoric acid solution is 3;
[0086] S102: Add the acid-washed sil...
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