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A kind of silicon dioxide preparation method and prepared silicon dioxide

A silicon dioxide and silicon slag technology, applied in the direction of silicon dioxide, silicon oxide, etc., can solve the problems of waste of resources, pollution of the working environment, failure of normal sales and effective utilization, etc., to achieve the effect of increasing added value and ensuring purity

Active Publication Date: 2022-06-28
XINTE ENERGY
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0004] Polysilicon is the most basic material for semiconductors, solar photovoltaic cells, and integrated circuits. In the production of polysilicon, some fine particle silicon slag will be produced, and these silicon slags cannot meet customer needs in size, so they cannot be sold normally and effectively utilized.
At the same time, these fine silicon residues will not only pollute the working environment, but also pollute qualified products.
In the actual production process, in order to prevent the pollution of polysilicon and the working environment, these silicon powders are simply collected and not used effectively, resulting in a certain waste of resources

Method used

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  • A kind of silicon dioxide preparation method and prepared silicon dioxide

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preparation example Construction

[0049] The present invention provides a method for preparing silicon dioxide, comprising the following steps:

[0050] Step 1, the silicon slag is pulverized and then added to an acid solution for pickling to remove impurities in the silicon slag;

[0051] Step 2, adding the silicon slag after removing impurities into ultrapure water, heating to a target temperature, and stirring, and the target temperature is the temperature at which silicon and ultrapure water can be reacted to obtain xSiO 2 ·yH 2 O solution, where x>y;

[0052] Step 3, the xSiO 2 ·yH 2 O solution, wherein x>y, is placed in a container containing several grooves, and calcined at high temperature to obtain a high-purity silica product.

[0053] The present invention also provides a silica prepared by the above-mentioned method.

Embodiment 1

[0055] A method for preparing silicon dioxide of the present embodiment comprises the following steps:

[0056] Step 1, adding the pulverized silicon slag into an acid solution for pickling to remove impurities in the silicon slag;

[0057] Specifically, step 1 is divided into the following steps:

[0058] S100: Collect the silicon slag with a particle size of ≥10 meshes produced in the polysilicon production process, and then add the collected silicon slag into ultrapure water for ultrasonic cleaning. The ultrasonic cleaning time is 0.5h, and the cleaned silicon slag is pulverized. The particle size range of the crushed silicon slag is ≥200 mesh;

[0059] S101: Immerse the pulverized silicon slag in an acid solution for pickling to remove contaminants and impurities adhering to the surface of the silicon slag; in this embodiment, the acid solution is a mixed solution of nitric acid and hydrofluoric acid, and the The ratio is not required, just ensure that the pH of the mixe...

Embodiment 2

[0081] A method for preparing silicon dioxide of the present embodiment comprises the following steps:

[0082] Step 1, adding the pulverized silicon slag into an acid solution for pickling to remove impurities in the silicon slag;

[0083] Specifically, step 1 is divided into the following steps:

[0084] S100: Collect the silicon slag with a particle size of ≥10 meshes generated during the production of polysilicon, and then add the collected silicon slag into ultrapure water for ultrasonic cleaning. The ultrasonic cleaning time is 3 hours. The cleaned silicon slag is pulverized. After pulverization The particle size range of the silicon slag is ≥200 mesh;

[0085] S101: soak the pulverized silicon slag in an acid solution for pickling to remove pollutants and impurities adhering to the surface of the silicon slag; in this embodiment, the acid solution is a hydrofluoric acid solution, and the pH of the hydrofluoric acid solution is 3;

[0086] S102: Add the acid-washed sil...

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Abstract

The invention discloses a method for preparing silicon dioxide, which comprises the following steps: 1) adding the pulverized silicon slag to an acidic solution for pickling to remove impurities from the silicon slag; 2) adding the silicon slag after removing impurities to a super The pure water is heated to the target temperature and stirred, and the target temperature is the temperature at which silicon can react with ultrapure water to obtain xSiO 2 ·yH 2 O solution, wherein, x>y; 3) xSiO 2 ·yH 2 The O solution, where x>y, is placed in a container containing several grooves, and calcined at high temperature to obtain a finished product of high-purity silica. The invention also discloses a silicon dioxide, which is prepared according to the above-mentioned preparation method. The silicon dioxide preparation method of the present invention uses silicon slag as a raw material, which can prevent the silicon slag from polluting polysilicon and the working environment, and can effectively utilize the silicon slag to save resources.

Description

technical field [0001] The invention belongs to the technical field of silicon dioxide, and in particular relates to a method for preparing silicon dioxide. Background technique [0002] At present, high-purity silica has been used in many fields. Unimin in the United States uses quartz ore to produce SiO 2 High-purity quartz sand with a content of 99.999% almost monopolizes the entire high-purity quartz sand market. my country's quartz sand resource reserves are very rich, but the domestic production technology level is not high, and the quality of the quartz sand produced is not high. With the development of high-tech in my country, the demand for high-purity quartz sand will also increase greatly. In order to break the foreign technology monopoly, it is necessary to improve the industrial production technology level of domestic high-purity quartz sand. [0003] The preparation of high-purity silica is divided into two types: natural method and synthetic method. The na...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C01B33/12
CPCC01B33/12C01P2006/80
Inventor 仝少超银波范协诚王瑞聪闵中龙
Owner XINTE ENERGY
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