Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Silicon rod crystal line growth state detection method, device and equipment

A technology of growth state and detection method, which is applied in measuring devices, testing semiconductor impurities, image data processing, etc., can solve the problem of accurately determining the crystal line characteristic pixel value and crystal line plane height X, and the crystal line on the surface of a single crystal silicon rod. The characteristics are not obvious, the diameter of the single crystal silicon rod fluctuates, etc.

Active Publication Date: 2021-03-05
LONGI GREEN ENERGY TECH CO LTD
View PDF10 Cites 4 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] However, in the current scheme, during the actual growth process, the diameter of the single crystal silicon rod will fluctuate, and the crystal line features on the surface of the single crystal silicon rod are not obvious, making it difficult to accurately determine the pixel value of the crystal line feature and the grain size. Line plane height X, which makes the process of detecting crystal lines less accurate

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Silicon rod crystal line growth state detection method, device and equipment
  • Silicon rod crystal line growth state detection method, device and equipment
  • Silicon rod crystal line growth state detection method, device and equipment

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0070] refer to figure 1 , figure 1 A flow chart of the steps of a method for detecting the growth state of a silicon rod crystal line in Embodiment 1 of the present invention is shown. The method may include the steps of:

[0071] Step 101 , acquiring a sample image of the silicon rod while the silicon rod is growing in equal diameter.

[0072] refer to figure 2 , shows a schematic diagram of a silicon rod preparation device in Embodiment 1 of the present invention.

[0073] In the embodiment of the present invention, when using the Czochralski method to prepare single crystal silicon, the single crystal furnace 104 is used to melt high-purity polycrystalline silicon material in the quartz crucible 102, and the lower end of the single crystal seed crystal is immersed in the quartz crucible The liquid surface of the molten silicon 103, and the lower end of the single crystal seed crystal are sequentially subjected to the seeding, shouldering, shoulder turning, equal-diame...

Embodiment 2

[0099] see Figure 5 , shows a flow chart of the steps of a method for detecting the state of crystal line growth of a silicon rod in Embodiment 2 of the present invention, and the method may include the following steps:

[0100] Step 201 , acquiring a sample image of the silicon rod when the silicon rod is growing in equal diameter.

[0101] For this step, reference may be made to the above-mentioned step 101 for details, which will not be repeated here.

[0102] Step 202: Perform image enhancement processing on the sample image according to a preset image enhancement algorithm.

[0103] In this step, image enhancement can be performed on the sample image of the silicon rod to enhance the characteristics of the crystal lines in the sample image, and expand the difference between the crystal lines and other regions in the sample image, which is beneficial to improve the follow-up according to the sample image. The gray value curve corresponding to the detection area determines...

Embodiment 3

[0175] refer to Figure 14 , which shows a structural block diagram of a silicon rod crystal line growth state detection device in Embodiment 3 of the present invention, which may specifically include:

[0176] The sample image acquisition module 301 is configured to acquire a sample image of the silicon rod when the silicon rod is growing in equal diameter.

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention provides a silicon rod crystal line growth state detection method, device and equipment, and relates to the technical field of monocrystalline silicon, and the method comprises the steps: obtaining a sample image of a silicon rod in an equal-diameter growth process of the silicon rod; setting a detection area on the sample image, wherein the detection area is overlapped with the crystal line growth line of the silicon rod; generating a gray value curve of the detection area; and determining the growth state of the crystal line of the silicon rod on the crystal line growth line according to the gray value curve of the detection area. According to the method, the sample image of the silicon rod in the growth process is collected in real time, the detection area is arranged on the sample image, and the growth state of the crystal line of the silicon rod can be determined according to the gray value curve of the detection area so that whether the silicon rod is a monocrystalline silicon rod or not is judged; by adopting the method, the influence of the fluctuation of the diameter of the silicon rod and the unobvious characteristics of the crystal wire on the detection process of the crystal wire is reduced so that the detection precision and the detection efficiency of the crystal wire are improved, and the operation is simple.

Description

technical field [0001] The invention relates to the technical field of single crystal silicon, in particular to a method, device and equipment for detecting the crystal line growth state of a silicon rod. Background technique [0002] In the process of preparing single crystal silicon by the Czochralski method, there are four crystal lines distributed at equal intervals on the surface of the single crystal silicon rod along the axial direction. If dislocation or thermal stress occurs in the single crystal silicon rod, it will cause crystal When switching from single crystal growth to polycrystalline growth, the crystal line on the surface of the single crystal silicon rod is broken. Therefore, whether there are 4 continuous crystal lines on the silicon rod can be used to judge whether the crystal rod is single crystal silicon or polycrystalline silicon. [0003] The existing method for automatically detecting crystal lines is to take real-time pictures of growing silicon rod...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): G01N21/84G06T7/00
CPCG01N21/84G06T7/0004G01N2021/8461G06T2207/30148
Inventor 郭力李侨徐战军
Owner LONGI GREEN ENERGY TECH CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products