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Acidic etching solution cyclic regeneration system and method

A technology of acid etching solution and regeneration system, which is applied in the direction of photographic technology, electrodes, diaphragms, etc., can solve the problems of reducing the etching line speed and quality, achieve the effect of restoring etching ability, high copper selling price, and saving production materials

Inactive Publication Date: 2021-03-09
江苏净拓环保科技有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, this technology will seriously reduce the speed and quality of the etching line, which is difficult for most manufacturers to accept

Method used

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  • Acidic etching solution cyclic regeneration system and method
  • Acidic etching solution cyclic regeneration system and method
  • Acidic etching solution cyclic regeneration system and method

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Embodiment Construction

[0035] The technical solutions in the embodiments of the present invention will be clearly and completely described below. Obviously, the described embodiments are only some of the embodiments of the present invention, but not all of them. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the protection scope of the present invention.

[0036] The present invention overcomes the deficiencies in the prior art in order to meet the actual needs, on the one hand, the present invention provides a kind of acid etching solution circulation regeneration system, such as figure 1 As shown, it includes ion membrane electrolysis circulation system 1, chlorine gas absorption system 2 and regeneration solution deployment monitoring system 3;

[0037] like figure 1 and figure 2 As shown, ion-exchange membrane electrolysis circulation system 1 is structured as a solution circul...

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Abstract

The invention discloses an acidic etching solution cyclic regeneration system. The system comprises an ionic membrane electrolysis circulating system, a chlorine absorption system and a regeneration solution blending monitoring system. The ionic membrane electrolysis circulating system is constructed into a solution circulating loop and comprises an electrolysis system. The chlorine absorption system comprises a chlorine treatment cylinder, an alkali liquor pool and a chlorine treatment tower secondary absorption system. The chlorine treatment cylinder and the alkali liquor pool respectively suck chlorine through negative pressure generated by an ejector and introduce the chlorine into low ORP etching liquor and an alkaline solution. An ORP monitor is used for controlling generation of chlorine by controlling the ORP value of the electrolytic etching solution. By controlling the ORP value of the electrolytic etching solution, generation of chlorine is effectively controlled, monovalentcopper ions are changed into divalent copper ions, the etching capability is recovered, operation completely returns to production, oxidants used in production are reduced or even canceled, production materials are saved, and the production cost is reduced.

Description

technical field [0001] The invention relates to the technical field of acid etching solution recovery, in particular to an acid etching solution recycling system and method. Background technique [0002] Acid etching is an important step in the production of printed circuit boards. As the etching progresses, the concentration of copper ions in the etching solution becomes higher and higher, and the etching speed becomes slower and slower. If it is not replaced, the etching progress and quality will be seriously affected. Acidic etching waste liquid not only contains a large amount of copper ions, but also contains other valuable chemical substances. Therefore, manufacturers will basically dispose of it by themselves or entrust qualified merchants to recycle it. [0003] At present, there are many ways to recover copper in the etching waste solution, and representative technologies include: [0004] 1. Chemical method. Add NaOH to the waste liquid, combine with copper ion...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23F1/46C25C7/00C25C1/12C25C7/06C25C7/02C25C7/04
CPCC23F1/46C25C1/12C25C7/00C25C7/02C25C7/04C25C7/06Y02P10/20
Inventor 欧阳锋邰康乾龙正
Owner 江苏净拓环保科技有限公司
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