Glass polishing liquid, preparation method thereof, and method of using same for polishing treatment
A polishing liquid and glass technology, applied in the chemical field, can solve the problems of easy sedimentation, agglomeration and agglomeration of polishing powder particles, and particle loss.
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Embodiment 1
[0066] Embodiment 1 prepares glass polishing liquid
[0067] The composition and weight percent of the first concentrated solution in the present embodiment are as follows:
[0068] The middle cerium polishing powder (CeO 2 The mass percentage of lanthanum oxide is 80%; the mass percentage of lanthanum oxide is 20%; particle size: D50: 0.55 μm; D90: 1.46 μm, specific gravity 6.5);
[0069] 3 parts by weight of sodium hexametaphosphate (total phosphate (in P 2 o 5 The mass percent content of meter) is 68.1%; Inactive phosphate (in P 2 o 5 The mass percent composition of total) is 6.5%; the mass percent composition of water-insoluble matter is 0.03%);
[0070] The sodium dodecylsulfonate of 0.002 parts by weight;
[0071] 46.998 parts by weight of water (conventional water).
[0072] The manufacturing process of this first concentrated solution is:
[0073] In the first tank (the tank body is made of polyvinyl chloride, with a volume of 500L and an inner diameter of 700m...
Embodiment 2
[0085] Embodiment 2 prepares glass polishing fluid
[0086] Compared with Example 1, sodium fluoride was added in the second concentrate.
[0087] The composition and manufacturing process of the first concentrated solution in this embodiment are the same as those in Embodiment 1.
[0088] The composition and weight percent of the second concentrated solution in the present embodiment are as follows:
[0089] The middle cerium polishing powder (CeO 2 The mass percentage of lanthanum oxide is 80%; the mass percentage of lanthanum oxide is 20%; particle size: D50: 0.55 μm; D90: 1.46 μm, specific gravity 6.5);
[0090] 0.3 parts by weight of polyacrylic acid (CH 2 CH) n COOH);
[0091] 0.3 parts by weight of polyethylene glycol PEG-4000 (HO(CH 2 CH 2 O) n H);
[0092] The sodium fluoride (NaF) of 0.2 parts by weight;
[0093] The sodium chloride (NaCl) of 0.2 parts by weight;
[0094] 0.2 parts by weight of barium metaborate (Ba(BO 2 ) 2 );
[0095] 48.8 parts by we...
Embodiment 3
[0099] Embodiment 3 glass polishing liquid
[0100] The composition and weight percent of the first concentrated solution in the present embodiment are as follows:
[0101] The middle cerium polishing powder (CeO 2 The mass percentage of lanthanum oxide is 80%; the mass percentage of lanthanum oxide is 20%; particle size: D50: 0.55 μm; D90: 1.46 μm, specific gravity 6.5);
[0102] 2 parts by weight of sodium hexametaphosphate (total phosphate (in P 2 o 5 The mass percent content of meter) is 68.1%; Inactive phosphate (in P 2 o 5 The mass percent composition of total) is 6.5%; the mass percent composition of water-insoluble matter is 0.03%);
[0103] The sodium dodecylsulfonate of 0.001 parts by weight;
[0104] 58.999 parts by weight of water (conventional water).
[0105] The composition and weight percent of the second concentrated solution in the present embodiment are as follows:
[0106] 40 parts by weight of the middle cerium polishing powder (CeO 2 The mass per...
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