Maskless laser direct writing system and maskless laser direct writing method

Abstract

The present invention relates to a maskless laser direct writing system and a maskless laser direct writing method. The maskless laser direct writing system comprises an optical fiber array comprisinga plurality of optical fibers arranged in M rows * N columns; a sample table which is suitable for bearing a to-be-photoetched workpiece, wherein the to-be-photoetched workpiece is provided with a target etching layout; a layout data conversion module which is suitable for converting the target etching layout into a modular graph according to the parameters of the optical fiber array, wherein themodular graph comprises a plurality of target graph modules, each target graph module comprises a plurality of target graph units arranged in M rows * N columns, and each target graphic unit comprises a plurality of grids arranged in k rows * j columns; and a control module which is suitable for controlling each optical fiber to output a laser beam and turn off the laser beam, and is also suitable for controlling the optical fiber array and the sample table to perform relative displacement. According to the maskless laser direct writing system, the imaging efficiency can be improved.

Description

technical field [0001] The invention relates to the technical field of photolithography, in particular to a maskless laser direct writing system and a maskless laser direct writing method. Background technique [0002] Lithography is an important technology to realize the transfer of chip processing graphics. Lithography is mainly divided into two categories: optical lithography and non-optical lithography. Different from optical lithography, non-optical lithography does not depend on a mask, and can directly form graphics on the wafer to be processed, which not only reduces technical complexity, but also reduces chip development costs, so it has become the next generation of attention. Photolithography. [0003] According to different lithography mechanisms, non-optical lithography is mainly divided into three categories: electron beam direct writing, ion beam direct writing and laser direct writing. Among them, laser direct writing is to form a pattern by focusing the la...

AI Technical Summary

Problems solved by technology

[0004] The technical problem to be solved by the present invention is to overcome the problem of poor maskless patterning efficiency in the prior art

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