Infrared long-wave cut-off filter and preparation method thereof
A cut-off filter, long-wave technology, applied in the direction of filters, optics, optical components, etc., can solve the problems of less variety of infrared film materials and difficult preparation.
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[0052] An infrared long-wave cut-off filter, the film structure of the filter is:
[0053] MLMHM|Sub|(MH)^11M
[0054] Among them, Sub is the substrate, (MH)^11M is the short-wave pass filter film system, MLMHM is the anti-reflection film system, H is the Ge film layer, M is the ZnS film layer, and L is the YbF film 3 film layer.
[0055] The substrate is a Ge substrate.
[0056] A preparation method of an infrared long-wave cut-off filter, comprising the steps of:
[0057] Step 1: Coating an anti-reflection film system on one side of the germanium substrate;
[0058] Step 1.1: Clean the substrate and bombard it with an ion source for 3 to 5 minutes;
[0059] Step 1.2: Bake the substrate and evacuate to 1×10 -3 Pa, heat the substrate to 120°C and keep it warm for 1 hour;
[0060] Step 1.3: Plating the first layer of film, using ZnS film material for evaporation, and using ion source to assist deposition, the pressure of the vacuum chamber during evaporation is 5×10 -3 P...
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