CCOS shear thickening polishing method

A polishing liquid and thickening agent technology, applied in grinding/polishing equipment, polishing compositions containing abrasives, optical surface grinders, etc., can solve the limitation of mass production of workpieces and the convergence of surface quality, surface shape and roughness The speed is slow, the surface of the workpiece is prone to scratches, etc., to achieve the effect of good shear thickening effect, strong particle aggregation effect, and easy construction.

Active Publication Date: 2021-04-16
NAT UNIV OF DEFENSE TECH
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  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] However, the surface shape and roughness convergence speed of Computer Controlled Optical Surfacing (CCOS) is too slow, which affects the processing efficiency, and is easily affected by factors such as the quality and flatness of the polishing disc. Due to uneven pressure distribution and other reasons, the surface of the processed workpiece is prone to defects such as scratches and damage, resulting in a decrease in roughness and non-convergence of the surface shape, which in turn limits the large-scale production and surface quality of the workpiece.

Method used

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  • CCOS shear thickening polishing method

Examples

Experimental program
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Effect test

Embodiment 1

[0068] In this example, the polishing method of CCOS shear thickening applies the thickening and lubricating properties of shear thickeners uniformly to CCOS processing.

[0069] The mathematical model of the deterministic removal of the modification device based on shear thickening polishing in this embodiment is the Preston equation, namely:

[0070] R(x,y)=kP(x,y,t)V(x,y,t)

[0071] In the above formula, (x, y) is the coordinate of a certain point on the workpiece, R(x, y) represents the removal efficiency, k represents the coefficient related to the processed material, process parameters, etc., P(x, y, t) Indicates the pressure exerted by the polishing disc on a certain point on the workpiece surface at time t, that is, the pressure distribution function on the workpiece surface, and V(x, y, t) indicates the relative movement speed between the point and the polishing disc at time t.

[0072] Specific steps are as follows:

[0073] 1. Prepare a suitable shear thickener to...

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Abstract

The invention discloses a CCOS shear thickening polishing method. A shear thickening polishing solution is led in for thickening in the process of machining a workpiece by adopting a polishing disk in a CCOS process, so as to improve the flatness and the surface shape precision of CCOS machining. The method has the capacity of modifying the surface of a low-precision workpiece, a medium-precision workpiece and a high-precision workpiece, it is not necessary to apply all machining equipment, various errors caused by equipment replacement are avoided, the surface of the workpiece can be modified, and meanwhile, the flatness and the surface shape precision of the surface of the workpiece can be improved. The method has the advantages that a device is simple, easy to build and low in cost.

Description

technical field [0001] The technical field of optical processing of the present invention particularly relates to a CCOS shear thickening polishing method, which is used to realize high-efficiency, high-quality surface-quality modification processing. Background technique [0002] Optical processing technology plays an extremely important role in aviation, aerospace, electronics, semiconductor and other industries, especially precision optical components that require high surface quality are the core components of modern ultra-precision optical systems. It has very important applications in various laser systems, micro-electromechanical systems, laser gyroscopes, magnetic head processing, deep ultraviolet, X-ray and other fields. [0003] However, the surface shape and roughness convergence speed of Computer Controlled Optical Surfacing (CCOS) is too slow, which affects the processing efficiency, and is easily affected by factors such as the quality and flatness of the polis...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B24B1/00B24B13/00B24B13/01C09G1/02
Inventor 戴一帆尹联民关朝亮胡皓
Owner NAT UNIV OF DEFENSE TECH
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