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Pressure measuring device and pressure measuring method for immersion flow field

A measuring device and pressure technology, applied in the field of immersion lithography, can solve problems such as changing immersion liquid, lowering exposure quality, and lowering optical uniformity of immersion liquid, so as to achieve the effect of ensuring reliability

Pending Publication Date: 2021-04-20
ZHEJIANG CHEER TECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] The present invention solves the problem that the existing immersion lithography machine realizes continuous renewal of the immersion flow field through liquid injection and recovery, which will cause fluctuations in the immersion flow field, and pressure fluctuations in the immersion flow field will change the optical properties of the immersion liquid, resulting in The optical uniformity of the immersion liquid is reduced, which in turn leads to the reduction of the exposure quality. The current situation provides a method that can effectively detect the pressure of multiple positions in the immersion flow field to evaluate the pressure uniformity of the entire immersion flow field, so as to effectively ensure the exposure beam. The pressure measurement device and pressure measurement method of the immersion flow field in which the immersion liquid on the propagation path maintains good pressure characteristics

Method used

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  • Pressure measuring device and pressure measuring method for immersion flow field
  • Pressure measuring device and pressure measuring method for immersion flow field
  • Pressure measuring device and pressure measuring method for immersion flow field

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Experimental program
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Embodiment A

[0029] figure 1 , figure 2 In the shown embodiment, a pressure measurement device for an immersion flow field is characterized in that it includes a housing and a plurality of pressure detectors, the housing has the shape and size of the terminal objective lens in an immersion lithography machine, and the housing has The bottom surface of the mirror facing the substrate and the side surface of the mirror facing the immersion control unit, the bottom surface of the mirror is in the shape of a plane, and the side surface of the mirror is in the shape of an inclined annular cylinder; the bottom surface of the mirror has an opening, and the detection surface of the pressure detector is arranged in the opening; the pressure detection The detection surface of the detector is flush with the bottom surface of the mirror. The pressure detector adopts a pressure sensor whose detection surface diameter is less than or equal to 15mm.

Embodiment B

[0031] image 3 In the illustrated embodiment, the pressure detector adopts a pressure-sensitive chip 141 , and the pressure-sensitive chip is located at the end of the pressure measuring hole on the bottom surface of the mirror facing the inside of the casing. The pressure-sensing chip adopts a detection surface whose size range is less than 1.5mm×1.5mm. The pressure sensing chip 141 may be a piezoresistive pressure sensing chip. Others are identical with embodiment 1.

Embodiment C

[0033] Figure 4 In the illustrated embodiment, the immersion control unit has a central through hole 31 that allows the exposure beam to pass through. The exposure beam passes through the immersion flow field inside the central through hole of the immersion control unit. inside the boundary; the pressure detectors are respectively arranged at the center and the apex of the central boundary. Further, a pressure detector is installed at the midpoint of the sides of the central enclosure. Further, a pressure detector is installed within a range of 5-22 mm from the wall surface of the central through hole. Others are identical with embodiment 1.

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Abstract

The invention discloses a pressure measuring device and a pressure measuring method for an immersion flow field. The pressure measuring device comprises a shell and a plurality of pressure detectors, wherein the shell has a shape and a size for simulating a tail-end objective lens in an immersion lithography machine; the shell is provided with a mirror bottom surface facing a substrate and a mirror side surface facing an immersion control unit, the mirror bottom surface is in a plane shape, and the mirror side surface is in an inclined annular cylindrical surface shape; and the detection surfaces of the pressure detectors are flush with the mirror bottom surface. According to the invention, the shape of an immersion flow field and the flow parameters of immersion liquid in the immersion lithography machine are simulated, and the pressure of the immersion flow field, particularly the pressure of the immersion flow field on an exposure beam propagation path is measured, so whether the structure of the immersion control unit and fluid supply and recovery parameters meet exposure requirements or not are checked and evaluated. By adopting a method of filling a pressure measuring hole with soluble gas in advance, bubbles near the detection surfaces of the pressure detectors are prevented from interfering the precision of pressure measurement.

Description

technical field [0001] The invention relates to the technical field of immersion photolithography, in particular to a measuring device and a measuring method for measuring the pressure of an immersion flow field. Background technique [0002] The lithography machine is one of the core equipment for manufacturing VLSI. It uses the optical system to accurately project the circuit pattern on the mask onto the photoresist-coated substrate and modify the photoresist exposure to modify the photoresist. Circuit pattern information is left on the substrate. It includes a laser light source, a projection objective lens system, a projection mask containing circuit patterns and a substrate coated with photosensitive photoresist. [0003] Compared with the dry lithography machine in which the intermediate medium is gas, the immersion lithography (Immersion Lithography) equipment fills a liquid with a high refractive index (called immersion liquid or immersion liquid) between the last p...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/20
Inventor 符文静王帅熊永乐徐文苹徐宁付新
Owner ZHEJIANG CHEER TECH CO LTD