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Electrostatic resonator based on periodic elastic wave reflection structure

A reflective structure and resonator technology, applied in electrical components, impedance networks, etc., can solve the problems of small geometric size of devices and limitations of lithography process accuracy, achieve small size, avoid limitations of lithography accuracy, and reduce anchor loss. Effect

Pending Publication Date: 2021-05-25
INST OF SEMICONDUCTORS - CHINESE ACAD OF SCI
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  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, at higher frequencies, the device geometry is smaller. In order to achieve a higher quality factor, the size of the support structure needs to be further reduced, which is limited by the precision of the lithography process.

Method used

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  • Electrostatic resonator based on periodic elastic wave reflection structure
  • Electrostatic resonator based on periodic elastic wave reflection structure

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Embodiment Construction

[0032] The disclosure provides an electrostatic resonator based on a periodic elastic wave reflection structure, and the resonator includes a resonance unit, an electrode, a dielectric layer, a base, a supporting structure and a periodic elastic wave reflection structure. By setting the minimum repeating unit on the substrate to form a periodic elastic wave reflection structure, a stop band is formed on the resonator substrate, thereby further reducing the anchor point loss of the resonator and greatly stably improving the quality factor of the resonator. In addition, the resonator is small in size and has a high quality factor, which effectively avoids the limitation of lithography precision, is easy to process, is conducive to improving the yield rate, realizes large-scale batch production of devices, significantly reduces costs, and promotes the development of MEMS resonators. In the process of practical application, the present disclosure is universal, and solves the bottle...

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Abstract

The invention provides an electrostatic resonator based on a periodic elastic wave reflection structure. The electrostatic resonator comprises a resonance unit; an electrode electrically connected with the resonance unit; a dielectric layer arranged between the resonance unit and the electrode; a supporting structure, wherein one end of the supporting structure is connected with the resonance unit, and the other end of the supporting structure is fixed on the substrate; the substrate comprises at least one layered structure; the periodic elastic wave reflection structure is arranged on the substrate; the periodic elastic wave reflection structure comprises at least one minimum repetitive unit, and the minimum repetitive unit is of a hole-shaped structure. The periodic elastic wave reflection structure can form a stop band on the resonator substrate, thereby further reducing the loss of the resonator anchor point, and greatly and stably improving the quality factor of the resonator. The resonator has universality, and solves the bottleneck problem that the MEMS resonator keeps a relatively high quality factor under high frequency.

Description

technical field [0001] The present disclosure relates to radio frequency micro-electromechanical systems, and in particular to an electrostatic high-quality factor resonator based on a periodic elastic wave reflection structure. Background technique [0002] The future wireless communication system presents the development trend of integration, miniaturization, low power consumption, high frequency, and multi-mode. The RF front-end transceiver system has the preprocessing function of RF signals and is an important part of the wireless communication system. The RF resonant devices used in traditional RF front-end transceiver systems mainly include quartz crystal oscillators, surface acoustic wave (SAW) filters, film bulk acoustic resonators (FBAR), ceramic filters, LC resonant circuits, etc. However, there are many limiting factors in the volume, performance, and power consumption of this traditional radio frequency device. For example, the resonance frequency of FBAR is dete...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H03H9/24H03H3/007
CPCH03H9/24H03H3/007
Inventor 贾倩倩杨晋玲袁泉陈泽基刘文立杨富华
Owner INST OF SEMICONDUCTORS - CHINESE ACAD OF SCI
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