Complex-surface thin film transistor and self-aligned electrofluid conformal photoetching manufacturing method
Patent Information
- Authority / Receiving Office
- CN · China
- Current Assignee / Owner
- HUAZHONG UNIV OF SCI & TECH
- Publication Date
- 2021-06-08
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Abstract
Description
technical field
[0001] The invention belongs to the technical field related to the preparation of organic thin film transistors, and more specifically, relates to a complex curved surface thin film transistor and a self-aligned electrofluid conformal lithography manufacturing method, in particular to an organic thin film with small channels on a complex curved surface substrate Transistor Self-Aligned Electrofluidic Conformal Lithographic Fabrication Method. Background technique
[0002] Organic thin-film transistor (OTFT) is the key driving electronic component of the next-generation display technology and multi-functional sensor in the future. The channel length (L) of its key feature structure has micro-nano dimensions. The current preparation process relies heavily on traditional lithography technology. Traditional lithography technology relies heavily on the manufacturing accuracy of the mask, the chemical properties of the photoresist, and the wavelength of the light s...