Combustible gas treatment device

Abstract

The invention provides a combustible gas treatment device, which is used for treating combustible gas in process waste gas discharged by a process chamber. The combustible gas treatment device comprises a combustion chamber and an absorption and storage chamber, wherein the combustion chamber is used for communicating the process chamber with the absorption and storage chamber; a high-temperature combustion assembly is arranged in the combustion chamber, the high-temperature combustion assembly is used for combusting combustible gas in the process waste gas discharged into the combustion chamber, and the combusted process waste gas enters the absorption and storage chamber; and a manufacturing material of the absorption and storage cavity can absorb and store the combustible gas in the process waste gas after combustion, and a first exhaust structure is arranged on the absorption and storage cavity and used for discharging the process waste gas which is not absorbed and stored. According to the combustible gas treatment device provided by the invention, the amount of the combustible gas discharged to the outside can be reduced, the process pollution is reduced, and the process safety is improved.

Description

technical field [0001] The present invention relates to the technical field of semiconductor equipment, in particular to a combustible gas processing device. Background technique [0002] The process waste gas discharged from the semiconductor process will inevitably contain combustible gases such as hydrogen. If the combustible gas is discharged directly without treatment, it will not only cause pollution, but also bring great safety hazards. Therefore, combustible gas treatment is usually set up. The device treats the combustible gas in the process exhaust gas. The existing combustible gas processing device usually burns the combustible gas at high temperature to avoid direct discharge of high-concentration combustible gas. However, the existing combustible gas processing device is After treatment, there will still be combustible gas emissions, which will cause pollution and cause safety hazards. Contents of the invention [0003] The present invention aims to solve at ...

AI Technical Summary

Problems solved by technology

[0002] The process waste gas discharged from the semiconductor process will inevitably contain combustible gases such as hydrogen. If the combustible gas is discharged directly without treatment, it will not only cause pollution, but also bring great safety hazards. Therefore, combustible gas treatment is usually set up. The device treats the combustible gas in the process exhaust gas. The existing combustible gas processing device usually burns the combustible gas at high temperature to avoid direct discharge of high-concentration combustible gas. However, the existing combustible gas processing device is After treatment, there will still be combustible gas emissions, which will cause pollution and cause safety hazards

Images