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Method for calibrating system parameters of dual-rotation compensator type Mueller matrix ellipsometer

A technology of double rotary compensator and rotary compensator, which is applied in the direction of instruments, scientific instruments, complex mathematical operations, etc., can solve the problem that the initial value deviation calibration result cannot be solved, and achieve stable calculation results, avoid system errors, and fast calibration speed Effect

Active Publication Date: 2021-08-20
HUAZHONG UNIV OF SCI & TECH
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Problems solved by technology

When using the LM algorithm for fitting, the fitting result is affected by the initial value of the fitting. If the initial value deviation is too large, the calibration result may not be solved.
The eigenvalue calibration method can only be applied to discrete measurement processes, such as four liquid crystal Muller matrix measurement systems

Method used

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  • Method for calibrating system parameters of dual-rotation compensator type Mueller matrix ellipsometer
  • Method for calibrating system parameters of dual-rotation compensator type Mueller matrix ellipsometer
  • Method for calibrating system parameters of dual-rotation compensator type Mueller matrix ellipsometer

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Embodiment 1

[0037] In an embodiment of the present invention, the calibration sample includes a polarizer with an azimuth angle of 0°, a polarizer with an azimuth angle of about 90°, and a quarter-wave plate with an azimuth angle of about 30°. The test method is as follows: image 3 Shown:

[0038] Step 1, place the above-mentioned three calibration samples on the first calibration plane 105 in turn, align the light path, and complete the data collection of light intensity information, and the result is denoted as I f i (t), where i=1, 2, 3, corresponding to different calibration samples in turn, can collect signals of multiple periods, and then take the average to reduce the influence of random errors in the system on the measurement results.

[0039] Step 2, place the above-mentioned three calibration samples on the second calibration plane 107 in turn, align the light path, and complete the data collection of light intensity information, and the result is denoted as I b i (t), where...

Embodiment 2

[0108] One embodiment of the present invention is aimed at 5:3 double rotation compensator type Muller matrix ellipsometer, implements the specific calibration method process as follows:

[0109] Step 100, according to the formula (7.1) (7.2) (7.3) (7.4) (8) and (9), after obtaining the sampling signal, perform Fourier analysis to obtain the Fourier coefficient, select the corresponding basis vector value and Solve the light intensity matrix D in the form of 5×5.

[0110]

[0111] S W (t)=[1cos10ωt sin10ωt cos20ωt sin20ωt] T (20.2)

[0112] S A (t)=[1cos6ωt sin6ωt cos12ωt sin12ωt] (20.3)

[0113]

[0114] where α i , β j are the Fourier coefficients of the sampled signal.

[0115] Step 200, after obtaining the light intensity matrix corresponding to each group of sampling signals, analyze the eigenvalues ​​of the Mueller matrix of the calibration sample according to the formula (11.1) (11.2), and deduce the calibration sample in the form of the Mueller matrix of ...

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Abstract

The invention discloses a method for calibrating system parameters of a dual-rotation compensator type Mueller matrix ellipsometer, and belongs to the field of precise optical measuring instrument system. The method comprises the steps that a plurality of calibration samples are sequentially placed on a calibration plane between a first rotation compensator and a second rotation compensator, and light intensity information of the calibration samples is collected; Fourier analysis is carried out on the light intensity information to obtain a Fourier coefficient of the light intensity information, and a matrix form function of the light intensity information is established in combination with the Fourier coefficient; and the matrix is solved form function of the light intensity information by using a characteristic value calibration method to obtain the calibrated modulation matrix of the polarizing arm and the calibrated analysis matrix of the polarization detecting arm, thereby completing the calibration of the system parameters. According to the method for calibrating the system parameters of the dual-rotation compensator type Mueller matrix ellipsometer, the system does not need to be modeled, system errors caused by modeling deviation can be avoided, the difficulty of system calibration is greatly reduced, and the calibration precision of the system is greatly improved.

Description

technical field [0001] The invention belongs to the field of system parameter calibration of precision optical measuring instruments, and more specifically relates to a method for calibrating system parameters of a double-rotating compensator type Mueller matrix ellipsometer. Background technique [0002] Compared with the traditional ellipsometer, which can only measure the amplitude ratio angle and phase difference angle of the sample, the double-rotating compensator Mueller matrix ellipsometer can measure the full Mueller matrix information of the sample, and can characterize the sample anisotropy and degradation. Partial and other more complex optical properties. This type of ellipsometer can obtain the Mueller matrix of the sample under the corresponding wavelength and incident angle by controlling the two compensators to rotate synchronously at a certain speed ratio. It has the advantages of simple modulation, high measurement accuracy, wide spectral coverage and syste...

Claims

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Application Information

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IPC IPC(8): G01N21/21G06F17/14G06F17/16
CPCG01N21/211G06F17/141G06F17/16G01N2201/12746
Inventor 陈修国盛胜庄锦峰刘世元
Owner HUAZHONG UNIV OF SCI & TECH
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