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Method and equipment for producing synthetic quartz glass

A technology for synthesizing quartz and glass, used in glass furnace equipment, glass manufacturing equipment, glass molding and other directions, can solve the problems of volatilization of metal impurities into loose bodies, increasing the difficulty of dehydroxylation sintering, and complicated indirect method processes, and achieves a beneficial effect. Cleaning and operation maintenance, avoid corrosion, reduce the effect of accumulation

Active Publication Date: 2021-09-07
神光光学集团有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0004] The invention provides a method and equipment for producing synthetic quartz glass, which solves the problem of complex process of the current indirect method, uneven temperature and heat field; dust and acid gas corroding the reaction chamber, causing metal impurities in the reaction chamber to volatilize into loose bodies; excessive water Molecules enter the loose body, which will increase the technical problem of the difficulty of dehydroxylation and sintering in the later stage

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  • Method and equipment for producing synthetic quartz glass
  • Method and equipment for producing synthetic quartz glass
  • Method and equipment for producing synthetic quartz glass

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Embodiment Construction

[0034] In the following, only some exemplary embodiments are briefly described. As those skilled in the art would realize, the described embodiments may be modified in various different ways, all without departing from the spirit or scope of the present invention. Accordingly, the drawings and descriptions are to be regarded as illustrative in nature and not restrictive.

[0035] In describing the present invention, it should be understood that the terms "center", "longitudinal", "transverse", "length", "width", "thickness", "upper", "lower", "front", " Back", "Left", "Right", "Vertical", "Horizontal", "Top", "Bottom", "Inner", "Outer", "Clockwise", "Counterclockwise", "Axial" The orientation or positional relationship indicated by , "radial", "circumferential", etc. is based on the orientation or positional relationship shown in the drawings, or the orientation or positional relationship that is usually placed when the product of the present invention is used, or the technic...

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Abstract

The invention provides a method and equipment for producing synthetic quartz glass, and solves the problems that the existing indirect method is complex in process and non-uniform in temperature thermal field; after the reaction chamber is corroded, metal impurities volatilize into the loose body; and excessive water molecules enter the loose body and the sintering difficulty is increased. The equipment for producing synthetic quartz glass comprises a reaction chamber provided with an exhaust passage; a lifting traction rod which is mounted at the top of the reaction chamber; an auxiliary combustor, wherein an output port of the auxiliary combustor is positioned in the reaction chamber; a raw material combustor, wherein an output port of the raw material combustor is positioned in the reaction chamber, wherein the lifting traction rod is used for driving the carrying rod to move up and down, the auxiliary combustor is located above the opposite side of the exhaust channel, the exhaust channel is located above the opposite side of the raw material combustor, and an included angle of 20-70 degrees is formed between the gas output direction of the raw material combustor and the vertical direction. When the loose body rises, the lifting traction rod enables the lowest end of the loose body to be kept at the height position lower than the inlet position of the exhaust channel.

Description

technical field [0001] The invention relates to the technical field of synthetic quartz glass, in particular to a method and equipment for producing synthetic quartz glass. Background technique [0002] The current method of preparing synthetic quartz glass mainly adopts the indirect method. The indirect method refers to the hydrolysis of the gaseous raw materials containing silicon components in the hydrogen-oxygen flame, and the formation of porous loose silica particle accumulations (loose bodies) at low temperatures, and then through the second high temperature of the loose bodies Heating removes moisture and vitrifies it into a synthetic quartz material. [0003] However, there are still many deficiencies in the actual production of the indirect method: firstly, the process of the indirect method is complex, and the temperature and heat field during the formation of the silica matrix (loose body) have an impact on the accumulation of particles, thus determining the ref...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C03B20/00C03B19/01C03B5/235C03B5/16
CPCC03B20/00C03B5/2353C03B5/16C03B19/01Y02P40/57
Inventor 高运周王岗王正帅裴磊
Owner 神光光学集团有限公司
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