Low-kinetic-energy pulsed ion source based on photoionization
A low kinetic energy, ion source technology, applied in the direction of ion beam tubes, circuits, discharge tubes, etc., can solve the problems of uncertainty in the interpretation of the reaction mechanism and the lack of quantum state selectivity of ions
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Embodiment 1
[0031] This embodiment discloses a low kinetic energy pulsed ion source based on photoionization, such as Figure 1-Figure 4 As shown, it includes: ion acceleration lens group, deflection electrode group, first focusing electrode group, second focusing electrode group and ion deceleration assembly.
[0032] The ion acceleration lens group is used to generate and accelerate ions, and initially focus the ion beam;
[0033] The deflection electrode group is used to correct the spatial position and velocity direction of the preliminarily focused ion beam;
[0034] The first focusing electrode group is used to refocus the corrected ion beam;
[0035] The second focusing electrode group is used to focus the ion beam for the third time, so that the focus of the ion beam falls on the center of the reaction zone;
[0036] The ion deceleration component is used to decelerate the ion beam after the third focus, and cooperate with the first focusing electrode group and the second focusi...
Embodiment 2
[0044] In order to check the overall performance of the ion source in the present invention, Ar is used as the test object in this embodiment, and Ar is prepared by means of (3+1) resonance-enhanced multi-photon ionization (REMPI) using a 314.5nm laser. + ion beam, the Ar + The ions are decelerated to different kinetic energies, and the best focusing state that can be achieved under different ion kinetic energies is explored. Such as Figure 5 , 6 as shown, Figure 5 , 6 They are the ion velocity imaging diagram and the corresponding translation energy spectrum when the kinetic energy of the ion beam is 1.64eV, respectively. It can be seen from the figure that the full width at half maximum of the kinetic energy of the ion beam is only 150meV at this time, and the focusing effect of the ion beam is equivalent to that of the ion source in the prior art. This shows that the scheme in the present invention can produce a pulsed ion beam that is continuously adjustable in the ...
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