Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Nourishing and repairing facial mask

A mask and extract technology, applied in skin care preparations, cosmetics, cosmetic preparations and other directions, can solve the problems of reducing the comprehensiveness of consumers, scarcity of soothing and repairing, etc., and achieve the improvement of skin quality, low requirements for process conditions, and low processing technology. simple effect

Pending Publication Date: 2021-09-17
谢淑军
View PDF0 Cites 1 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] There are many types of facial masks in the current market, among which moisturizing and anti-aging are the mainstream, but the direction of soothing and repairing is relatively rare, which reduces the comprehensiveness of consumer choices

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0024] Embodiment 1: A nourishing and repairing mask, which is composed of the following components by weight: deionized water: 40-60 parts, glycerin: 50-70 parts, propylene glycol: 20-30 parts, betaine: 25-35 parts , Trehalose: 15-25 parts, Osmanthus seaweed extract: 5-15 parts, Scots pine bark extract: 5-10 parts, Artemisia sage leaf extract: 10-15 parts, Centella asiatica root extract: 8 ~14 parts, dipotassium glycyrrhizinate: 2~8 parts, plant amino acids: 3~7 parts, xanthan gum: 1~5 parts, hydroxyethyl cellulose: 2~4 parts, disodium EDTA: 1~4 parts Parts, tocopherol: 2-5 parts, allantoin: 1-5 parts, caprylyl hydroxamic acid: 0.4-0.8 parts, glyceryl caprylate: 0.3-0.6 parts.

[0025] A method for making a nourishing and repairing facial mask, comprising the following steps:

[0026] S1, each raw material is weighed according to the composition proportion;

[0027] S2. Mix deionized water, glycerin, propylene glycol, betaine, and trehalose to obtain mixed liquid 1;

[002...

Embodiment 2

[0033] Embodiment 2: A nourishing and repairing mask, consisting of the following components by weight: deionized water: 10-30 parts, glycerin: 20-40 parts, propylene glycol: 10-20 parts, betaine: 5-25 parts , Trehalose: 3-15 parts, Osmanthus seaweed extract: 2-8 parts, European Scots pine bark extract: 3-6 parts, Artemisia annua leaf extract: 1-6 parts, Centella asiatica root extract: 3 ~10 parts, dipotassium glycyrrhizinate: 2~4 parts, vegetable amino acids: 1~3 parts, xanthan gum: 0.01~1 parts, hydroxyethyl cellulose: 1~2 parts, disodium EDTA: 0.01~0.08 parts Parts, tocopherol: 2 to 5 parts, allantoin: 2 to 4 parts, caprylyl hydroxamic acid: 0.3 to 0.6 parts, glyceryl caprylate: 0.2 to 0.4 parts.

[0034] A method for making a nourishing and repairing facial mask, comprising the following steps:

[0035] S1, each raw material is weighed according to the composition proportion;

[0036] S2. Mix deionized water, glycerin, propylene glycol, betaine, and trehalose to obtain m...

Embodiment 3

[0042]Embodiment 3: A nourishing and repairing mask, which is composed of the following components by weight: deionized water: 60-80 parts, glycerin: 70-90 parts, propylene glycol: 30-50 parts, betaine: 35-45 parts , trehalose: 30-45 parts, Osmanthus seaweed extract: 10-20 parts, European scots pine bark extract: 15-18 parts, wormwood leaf extract: 18-20 parts, centella asiatica root extract: 16 parts ~18 parts, dipotassium glycyrrhizinate: 3~9 parts, plant amino acids: 6~8 parts, xanthan gum: 4~5 parts, hydroxyethyl cellulose: 3~4 parts, disodium EDTA: 2~4 parts parts, tocopherol: 4 to 5 parts, allantoin: 3 to 5 parts, caprylyl hydroxamic acid: 0.6 to 0.8 parts, glyceryl caprylate: 0.8 to 1 part.

[0043] A method for making a nourishing and repairing facial mask, comprising the following steps:

[0044] S1, each raw material is weighed according to the composition proportion;

[0045] S2. Mix deionized water, glycerin, propylene glycol, betaine, and trehalose to obtain mix...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses a nourishing and repairing facial mask. The nourishing and repairing facial mask is prepared from the following components in parts by weight: 1 to 100 parts of deionized water, 1 to 100 parts of glycerol, 1 to 50 parts of propylene glycol, 1 to 50 parts of betaine, 1 to 50 parts of trehalose, 1 to 20 parts of a cladosiphon okamuranus extract, 1 to 20 parts of a scotch pine bark extract, 1 to 20 parts of an artemisia princeps leaf extract, 1 to 20 parts of a centella asiatica root extract, 0.01 to 10 parts of dipotassium glycyrrhizinate, 0.01 to 10 parts of plant amino acids, 0.01 to 5 parts of xanthan gum, 0.01 to 5 parts of hydroxyethyl cellulose, 0.01 to 5 parts of disodium EDTA, 0.01 to 5 parts of tocopherol, 0.01 to 5 parts of allantoin, 0.01 to 1 part of caprylhydroxamic acid and 0.01 to 1 part of glycerol caprylate. The facial mask provided by the invention can be used for relieving and repairing skin and supplementing nutrients needed by the skin when used, has the advantages of being mild and moistening and improving the skin quality, and enables the skin to be smooth and fine; meanwhile, a processing technology of the facial mask is simple, low in technological condition requirements and suitable for popularization and production; and all the components adopted by the facial mask are green and healthy and do not cause harm to the skin.

Description

technical field [0001] The invention relates to the technical field of daily cosmetics, in particular to a nourishing and repairing facial mask. Background technique [0002] Mask is a category of skin care products and a carrier of beauty care products. It is applied on the face for 15 to 30 minutes. When the nutrients of the skin care products are slowly absorbed by the skin, the film is removed. Its most basic and most important purpose is to make up for the lack of cleansing work of makeup remover and face wash, and on this basis, cooperate with other essence ingredients to achieve other maintenance functions, such as moisturizing, whitening, anti-aging, balancing oil and so on. [0003] There are many types of facial masks in the market today, among which moisturizing and anti-aging are the mainstream, but the direction of soothing and repairing is relatively rare, which reduces the comprehensiveness of consumer choices. Contents of the invention [0004] The purpos...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): A61K8/9789A61K8/9767A61K8/9722A61K8/73A61K8/67A61K8/63A61K8/60A61K8/49A61K8/44A61K8/42A61K8/37A61K8/34A61K8/02A61Q19/00
CPCA61K8/9789A61K8/9767A61K8/9722A61K8/731A61K8/73A61K8/678A61K8/63A61K8/60A61K8/4946A61K8/44A61K8/42A61K8/375A61K8/345A61K8/0212A61Q19/00
Inventor 谢淑军
Owner 谢淑军
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com