Production device and method of wide distribution micropowder-free ternary precursor
A technology for production equipment and precursors, which is applied in the field of production equipment for wide-distributed micropowder-free ternary precursors, can solve the problems of increased production costs of downstream products, inability to remove through sieving, and many micropowder particles, etc., to achieve high production efficiency , wide particle size distribution, precise and controllable particle size
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Embodiment approach 1
[0080] (1) Prepare a nickel-cobalt-aluminum sulfate solution A according to a predetermined ratio, so that the total metal concentration in the solution A is 1.6 mol / L; prepare a sodium hydroxide solution B with a hydroxide concentration of 10.0 mol / L; Prepare ammonia solution C with an ammonia radical concentration of 9.0 mol / L;
[0081] (2) Add an appropriate amount of pure water and ammonia solution into the main reaction device as the bottom liquid, and make the concentration of ammonia radicals in the bottom liquid 0.8mol / L, stir, and add NCA ternary precursor with D50 of 10.0 μm Seed;
[0082] (3) Seal the main reaction device, pass in argon as a protective gas, pump the solution A, the solution B and the solution C into the main reaction device at the same time in proportion, control the stirring speed to 200rpm, and control the temperature at 65 °C, the pH value is controlled at 12.5, and when the liquid level of the main reaction device is full, the slurry in the mai...
Embodiment approach 2
[0087] (1) Prepare a nickel-cobalt-aluminum sulfate solution A according to a predetermined ratio, so that the total metal concentration in the solution A is 1.5 mol / L; prepare a sodium hydroxide solution B with a hydroxide concentration of 6.0 mol / L; The preparation ammonia root concentration is the ammonia solution C of 7.0mol / L;
[0088] (2) Add an appropriate amount of pure water and ammonia solution to the main reaction device as the bottom liquid, and make the concentration of ammonia radicals in the bottom liquid 0.5mol / L, stir, and add NCA ternary precursor with a D50 of 9.0 μm Seed;
[0089] (3) Seal the main reaction device, feed nitrogen gas as a protective gas, pump the solution A, the solution B and the solution C into the main reaction device at the same time in proportion, control the stirring speed to 300rpm, and control the temperature at 55°C , the pH value is controlled at 11.5, and when the liquid level of the main reaction device is full, the slurry in th...
Embodiment approach 3
[0094] (1) Prepare a nickel-cobalt-aluminum sulfate solution A according to a predetermined ratio, so that the total metal concentration in the solution A is 2.0 mol / L; prepare a sodium hydroxide solution B with a hydroxide concentration of 8.0 mol / L; The ammonia solution C whose concentration of ammonia root is 8.0mol / L is prepared;
[0095] (2) Add an appropriate amount of pure water and ammonia solution into the main reaction device as the bottom liquid, and make the concentration of ammonia radicals in the bottom liquid 0.7mol / L, stir, and add NCA ternary precursor with D50 of 10.0 μm Seed;
[0096] (3) Seal the main reaction device, feed nitrogen gas as a protective gas, pump the solution A, the solution B and the solution C into the main reaction device at the same time in proportion, control the stirring speed to 300rpm, and control the temperature at 60°C , the pH value is controlled at 12.2, and when the liquid level of the main reaction device is full, the slurry in...
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