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Copolymer having carbosiloxane dendrimer structure, and composition, cosmetic ingredient, coating forming agent, and cosmetic containing same

A technology of macromolecular structure and carbosiloxane, which is applied in the fields of copolymers with carbosiloxane dendritic macromolecular structures, compositions containing the copolymers, cosmetic raw materials, film-forming agents and cosmetics, It can solve the problems that it is difficult to achieve reduction and large-scale production, and achieve the effect of low irritation, excellent safety performance and high purity

Pending Publication Date: 2021-11-16
DOW TORAY CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, there is a problem that an equivalent amount of hydrogenated unreacted monomer (saturated monomer) derived from an unsaturated monomer having a carbosiloxane dendrimer structure remains in the copolymer, and it is difficult to achieve reduction Purpose of monomers with carbosiloxane dendrimer structure
In addition, there is a problem that the hydrogenation reaction itself requires a special device, and in particular, it cannot be easily mass-produced

Method used

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  • Copolymer having carbosiloxane dendrimer structure, and composition, cosmetic ingredient, coating forming agent, and cosmetic containing same
  • Copolymer having carbosiloxane dendrimer structure, and composition, cosmetic ingredient, coating forming agent, and cosmetic containing same
  • Copolymer having carbosiloxane dendrimer structure, and composition, cosmetic ingredient, coating forming agent, and cosmetic containing same

Examples

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preparation example Construction

[0226] [The preparation method of the copolymer of the present invention]

[0227] As described above, the carbosiloxane dendrimer structure-containing monomer that is the raw material of the copolymer of the present invention has the property of being difficult to separate or remove from the copolymer by conventional distillation methods. However, the monomer can be reduced to 2500 ppm or less relative to the copolymer by the method for producing the copolymer of the present invention. In addition, the reaction time required for the radical polymerization reaction can be shortened and the industrial production efficiency can be improved by the production method including the following step (I).

[0228] The preparation method of the copolymer of the present invention is characterized in that,

[0229] To an unsaturated monomer (a1) having a carbosiloxane dendrimer structure containing an organic group capable of radical polymerization and

[0230] A step of adding a polymer...

Embodiment 1

[0258] [Preparation of copolymer and its liquid composition]

[0259] In a 1-liter four-neck flask equipped with a stirring device, a thermometer and a reflux tube, 163 g of isopropanol (IPA) was charged, nitrogen was bubbled in, fully degassed, and heated to 70° C. In the dropping funnel, add 110g methyl methacrylate (55% by weight), 10g n-butyl acrylate (5% by weight), 80g by following formula (A-1):

[0260] [chemical formula 26]

[0261]

[0262]Represented carbosiloxane dendrimer monomer (40% by weight), 4.4 g of 2,2'-azobis-2-isobutyric acid methyl ester (V-601, produced by Fujifilm Wako Pure Chemical Industries) ( 2.2% by weight), 107 g IPA and dissolved. In a nitrogen atmosphere, the monomer mixture was added dropwise from the dropping funnel for 1 hour while maintaining a temperature of 70°C. After completion|finish of dripping, it heated and stirred in nitrogen atmosphere for 3 hours, and added the solution which melt|dissolved 4.4 g of V-601 (2.2 weight%) in 3...

reference example 1

[0264] In a 1-liter four-necked flask equipped with a stirring device, a thermometer, and a reflux tube, 163 g of IPA was added, nitrogen was bubbled in, fully degassed, and heated to 70° C. Add 110g methyl methacrylate (55% by weight), 10g n-butyl acrylate (5% by weight), 80g carbosiloxane dendrimer monomer (A-1) (40% by weight) in the dropping funnel , 2gV-601 (1% by weight), and 107gIPA were dissolved. In a nitrogen atmosphere, the monomer mixture was added dropwise from the dropping funnel for 1 hour while maintaining a temperature of 70°C. After completion of the dropwise addition, heating and stirring were carried out under a nitrogen atmosphere for 8 hours to obtain a reaction product of 40.6% of non-volatile components. GPC analysis showed it to be a polymer with a peak molecular weight of 23600. And, as a result of analysis using high performance liquid chromatography, it was found that 30750 ppm of carbosiloxane dendrimer monomer (A-1) remained.

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Abstract

Provided are a copolymer having a carbosiloxane dendrimer structure, a composition containing the copolymer, a cosmetic raw material, a film-forming agent, a cosmetic, a method for producing the copolymer, and the like. The copolymer is characterized in that the content of monomers having a carbosiloxane dendritic macromolecular structure is significantly reduced. The invention also discloses the copolymer and uses thereof, wherein the copolymer is a copolymer of an unsaturated monomer (a1) having a carbosiloxane dendrimer structure containing a radically polymerizable organic group, and an unsaturated monomer (a2) having a radically polymerizable vinyl group and different from the component (a1). The content of the unreacted unsaturated monomer (a1) and the saturated monomer derived from the unreacted unsaturated monomer (a1) is 2,500ppm or less.

Description

technical field [0001] The present invention relates to a copolymer having a carbosiloxane dendrimer structure characterized by significantly reducing the content of monomers having a carbosiloxane dendrimer structure, a composition containing the copolymer, a cosmetic raw material, a composition The film agent and the cosmetic material further relate to the preparation method of the copolymer and the copolymer composition having the carbosiloxane dendrimer structure. Background technique [0002] It is well known that copolymers having a carbosiloxane dendrimer structure with excellent film-forming properties are used in cosmetics to improve the makeup retention effect of cosmetics, and to improve water resistance, sebum resistance, etc. (for example, Patent Document 1 etc.). The copolymer with carbosiloxane dendritic macromolecular structure is formed through free radical copolymerization reaction of unsaturated monomer with carbosiloxane dendritic macromolecular structur...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C08F6/10A61Q1/00A61Q15/00A61Q17/04A61Q19/00C08F220/18C08F230/08C08K5/05C08L43/04C08L91/00C08F2/00A61K8/31A61K8/34A61K8/891
CPCC08F6/003C08F220/14A61K8/895A61K8/34A61Q15/00A61Q19/00A61Q17/04A61Q1/00A61Q5/12A61K2800/10A61K2800/544C08F220/1804C08F230/085C08K5/05C08L33/12C08F230/08C08F220/18C08L43/04C08L91/00
Inventor 早田達央杉浦常仁枳梖正圭松叶将史
Owner DOW TORAY CO LTD
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