Device and method for growing silicon carbide crystals by liquid phase method
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- 北京晶格领域半导体有限公司
- Publication Date
- 2022-06-03
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Abstract
Description
Device and method for growing silicon carbide crystal by liquid phase method technical field The invention belongs to the silicon carbide single crystal liquid phase production technical field, relate in particular to a kind of liquid phase method growth silicon carbide crystal device and method. Background technique
[0002] Silicon carbide is one of the wide-bandgap semiconductor materials that has received extensive attention, with low density, large band gap, breakdown It has the advantages of high field strength, high saturation electron mobility, good thermal stability and chemical stability, etc. ideal substrate material for devices and blue light-emitting diodes. The main growth method of silicon carbide at present is physical vapor transport method, although this method is relatively mature, it has been the market The field supplies a large number of silicon carbide single crystal substrates, but due to the poor stability of the gas growth environment during...