Pvd thickness control

A technology of coating thickness and speed, which is applied to metal substrates, especially the field of coating metal strips with zinc, can solve problems such as slow atomization rate, no coating thickness, and non-compliance with quality requirements.

Pending Publication Date: 2021-11-30
SMS GRP GMBH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0010] Since the atomization process is a thermal process, in the case of process changes, such as changes in the coating thickness and / or width of the metal strip, the adjustment of the atomization rate will only be slow, resulting in the formation of sections on the metal strip Does not have the desired coating thickness and therefore does not meet quality requirements

Method used

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Embodiment Construction

[0033] exist figure 1 An embodiment variant of the device 1 according to the invention is shown schematically in a very simplified side view.

[0034] The plant 1 is suitable for carrying out the method according to the invention, in which a metal strip 10 is treated with a metal substrate 12 according to the principle of physical vapor deposition (PVD), wherein, through the parameters of strip speed and atomization rate, Adjust the coating thickness according to the formula below.

[0035]

[0036] in:

[0037]

[0038]

[0039]The plant 1 firstly comprises a continuous processing line 2 in which the metal strip 10 is first uncoiled by a first coiling device 11 and then recoiled at the end of the processing line 2 by a second coiling device 13 . Inside the processing line 2 the metal strip 10 is moved in the direction of movement of the arrow 3 and in this case passed through a plurality of stations.

[0040] In the embodiment variant described here, the plant 1 ...

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Abstract

The invention relates to a method for coating a metal strip (10) by means of a metal substrate (12) in a strip coating system (1), wherein the coating occurs according to the principle of a physical vapor deposition (PVD) and the layer thickness is adjusted by means of the parameters of the strip speed and the evaporation rate. According to the invention, in the event of a layer thickness change and/or width change of the metal strip (10), the evaporation rate and the strip speed are simultaneously modified such that the layer thickness change can be implemented directly, independently of the thermal evaporation process.

Description

technical field [0001] The invention relates to a method for coating a metal strip with a metal substrate, in particular zinc, in a strip coating plant, wherein the coating is carried out according to the principle of physical vapor deposition (PVD), and The coating thickness is adjusted via the parameters of strip speed and atomization rate. The invention also relates to a device for coating a metal strip with a metal substrate. Background technique [0002] Methods for applying passivation layers to metal strips are known in principle from the prior art. [0003] For example, document JPS6296669 discloses a method for coating a steel strip with a zinc layer, wherein the temperature of the steel strip is adjusted to a specific temperature range before coating. [0004] Document JPS63128168 discloses a method for coating a steel strip with a zinc layer, which has better deep-drawability. [0005] From the document JPH05287528 a control unit for a vapor depositor is known t...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/24C23C14/54
CPCC23C14/24C23C14/545
Inventor L·库梅尔T·道贝
Owner SMS GRP GMBH
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