Polishing process for improving surface roughness of silicon wafer

Abstract

The invention provides a polishing process for improving surface roughness of a silicon wafer. The process comprises the steps that S1, a crystal bar with the diameter being 200 mm and without single crystal defects (COP-Free) is selected, the equipment state is checked before polishing, and process adjustment is conducted after it is guaranteed that no abnormity exists; S2, the rotating speed of a large disc, the rotating speed of a center guide wheel and the temperature of a polishing ice maker are set; S3, a rough polishing pad is FPK660C2, an intermediate polishing pad is 7355-000FE, and a fine polishing pad is a 275NX flat pad; S4, the coordination of FFU setting and air exhaust setting in a feeding wax sticking machine of a polishing machine is guaranteed, the working state of an electrostatic ion rod is checked, and it is guaranteed that the internal environment of the wax sticking machine reaches the first-level particle standard; S5, the wax dripping amount is calibrated; S6, the polishing solution processing flow and the cooling water flow are calibrated; and S7, after polishing is finished, pre-washing feeding is conducted, and after a wax layer and surface particles on the back face of the product are washed up, the surface roughness of the product is measured. The processed silicon wafer has the advantage of low roughness.

Description

technical field [0001] The invention relates to the field of semiconductor manufacturing, in particular to a polishing process for improving the surface roughness of silicon wafers. Background technique [0002] Whether it is from a technological or economic point of view, the importance of semiconductors is huge and irreplaceable, and the government's support for the industry is also very firm. With the commissioning of my country's semiconductor manufacturing production line, the continuous improvement of semiconductor manufacturing technology and the rapid development of the semiconductor terminal product market, the semiconductor wafer market in mainland my country has entered a stage of rapid development. From 2016 to 2018, the semiconductor monocrystalline silicon wafer in mainland my country Sales rose from $500 million to $992 million, a compound annual growth rate of 41%. According to the calculation based on the annual compound growth rate, the sales of semiconduct...

AI Technical Summary

Problems solved by technology

[0003] The silicon wafers processed by the existing silicon wafer polishing process have high roughness

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