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A kind of water-based fully suspended diamond polishing liquid for sapphire, its preparation method and use

A sapphire and full-suspension technology, which is applied in the field of polishing liquid, can solve the problems of operators, equipment, natural environment hazards, low removal rate, and poor polishing quality, so as to improve the polishing surface quality, strong hydrophilicity, and improve smoothness degree of effect

Active Publication Date: 2022-07-05
ZHEJIANG AUFIRST MATERIAL TECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] The purpose of the present invention is to propose a water-based full-suspension diamond polishing solution for sapphire, aiming at the problem that the current sapphire polishing solution contains strong acid, strong alkali or other strong corrosive reagents, which are potentially harmful to operators, equipment and the natural environment. The polishing liquid is safe, environmentally friendly, green and non-polluting, and can maintain a fully suspended state for a long time, effectively avoiding or reducing the problem of agglomeration of diamond powder placed for a long time, resulting in poor polishing quality and low removal rate

Method used

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  • A kind of water-based fully suspended diamond polishing liquid for sapphire, its preparation method and use
  • A kind of water-based fully suspended diamond polishing liquid for sapphire, its preparation method and use
  • A kind of water-based fully suspended diamond polishing liquid for sapphire, its preparation method and use

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Embodiment 1-10

[0049] The components of the water-based fully suspended diamond polishing liquid of embodiment 1-10 sapphire and the quality ratio are shown in Table 1:

[0050] The preparation method of the water-based fully suspended diamond polishing liquid of embodiment 1-10 sapphire is as follows:

[0051] Step 1: Weigh each component according to the mass ratio;

[0052] Step 2: First, stir the ultrapure water and the suspending agent for 1 hour until the solution is milky white colloid, then add the dispersant and stir for 1 hour, then add the remaining components in turn, and continue to stir for 1 hour, until all the materials are dissolved and the mixture is uniform. colloid, adding diamond powder to obtain the water-based fully suspended diamond polishing solution for sapphire, the above steps are all carried out at 25°C, and the stirring speed is 300r / min.

[0053] Table 1 Examples 1-10

[0054]

[0055]

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Abstract

The invention provides a water-based fully suspended diamond polishing liquid for sapphire, a preparation method and application thereof. The water-based full-suspended diamond polishing liquid for sapphire of the present invention comprises the following components by mass ratio: 1-10 parts of suspending agent; 1-10 parts of dispersing agent; 10-15 parts of complexing agent; 0.1-0.5 part of rust inhibitor; 1-5 parts of wetting agent; 0.1-1 part of defoamer; 50-80 parts of ultrapure water; 0.1-0.5 part of diamond powder. The components used in the water-based fully suspended diamond polishing solution for sapphire of the present invention are inexpensive and belong to green environmental protection reagents, which do not cause harm to operators and the natural environment, and is beneficial to protecting polishing equipment. The polishing liquid of the invention has excellent polishing effect, simple composition, low price, and no harm to operators and the environment. The polishing liquid of the present invention is a full suspension system, which avoids the problems of scratches caused by agglomeration of diamond powder and the reduction of the removal rate to the greatest extent.

Description

technical field [0001] The invention relates to polishing liquid technology, in particular to a water-based fully suspended diamond polishing liquid for sapphire, a preparation method and application thereof. Background technique [0002] Sapphire's excellent mechanical properties, stable chemical properties and unique advantages in light transmission make it widely used in LED industry, military defense and other fields. With the continuous development of the LED industry and the iterative update of products, the requirements for the surface quality of the sapphire substrate are getting higher and higher, so the requirements for the polishing liquid are also getting higher and higher. [0003] Most of the sapphire polishing liquids reported so far have complex components and contain strong acids, alkalis or other strong corrosive reagents, which are potentially harmful to operators, instruments and natural environment, and are not in line with modern manufacturing and green...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C09G1/02
CPCC09G1/02
Inventor 侯军孙西
Owner ZHEJIANG AUFIRST MATERIAL TECH CO LTD
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