Low-friction thin film for inner wall of solar panel driving bearing and preparation method of low-friction thin film
A technology for driving bearings and solar panels, which is applied to the device for coating liquid on the surface, vacuum evaporation coating, coating, etc. It can solve the problem that it is difficult for space vehicle lubrication, and grease lubrication is prone to evaporation, decomposition or crosslinking and other problems, to achieve the effect of reducing the friction coefficient, increasing the service life, and lowering the preparation cost
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Embodiment 1
[0051] Step 1 Prepare the Ti layer: use GCr15 steel sheet as the substrate of the deep groove ball bearing, put it into acetone and alcohol for 30 minutes and ultrasonically clean it for 30 minutes, and dry it with a dust-free cloth after ultrasonic cleaning. Set the bias voltage of the deposition coating system to 500V, pass high-purity argon gas 20sccm; Ti target current 0.2A, perform bombardment etching pretreatment on the inner wall of the deep groove ball bearing for 10 minutes; deposit a Ti layer film on the inner wall of the pretreated bearing, The deposition and coating conditions are as follows: the bias voltage of the deposition and coating system is 95V, the high-purity argon gas is 18sccm; the Ti target current is 3A, and the deposition time is 12min.
[0052] Step 2 Preparation of MoS 2 -Ti / Pb layer: Deposit MoS on the surface of Ti film 2 -Ti / Pb, MoS 2 -The process parameters in the unbalanced magnetron sputtering process of Ti / Pb thin film are gas: high-purity...
Embodiment 2
[0058] Step 1 Prepare the Ti layer: use GCr15 steel sheet as the substrate of the deep groove ball bearing, put it into acetone and alcohol for 30 minutes and ultrasonically clean it for 30 minutes, and dry it with a dust-free cloth after ultrasonic cleaning. Set the bias voltage of the deposition coating system to 500V, pass high-purity argon gas 20sccm; Ti target current 0.2A, perform bombardment etching pretreatment on the inner wall of the deep groove ball bearing for 10 minutes; deposit a Ti layer film on the inner wall of the pretreated bearing, The deposition and coating conditions are as follows: the bias voltage of the deposition and coating system is 90V, the high-purity argon gas is 16sccm; the Ti target current is 2A, and the deposition time is 10min.
[0059] Step 2 Preparation of MoS 2 -Ti / Pb layer: Deposit MoS on the surface of Ti film 2 -Ti / Pb, MoS 2 -The process parameters in the unbalanced magnetron sputtering process of Ti / Pb thin film are gas: high-purity...
Embodiment 3
[0065] Step 1 Prepare the Ti layer: use the GCr15 steel sheet as the substrate of the deep groove ball bearing, put it in acetone and alcohol for 30 minutes and ultrasonically clean it for 30 minutes, and dry it with a dust-free cloth after the ultrasonic cleaning. Set the bias voltage of the deposition coating system to 500V, pass high-purity argon gas 20sccm; Ti target current 0.2A, perform bombardment etching pretreatment on the inner wall of the deep groove ball bearing for 10 minutes; deposit a Ti layer film on the inner wall of the pretreated bearing, The deposition and coating conditions are as follows: the bias voltage of the deposition and coating system is 100V, the high-purity argon gas is passed through 20sccm; the Ti target current is 4A, and the deposition time is 14min.
[0066] Step 2 Preparation of MoS 2 -Ti / Pb layer: Deposit MoS on the surface of Ti film 2 -Ti / Pb, MoS 2 -The process parameters in the unbalanced magnetron sputtering process of Ti / Pb thin fil...
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