Direct current and pulse superposition corrosion process
A pulse superposition and process technology, applied in the field of aluminum foil corrosion, can solve the problems of easy deformation of corrosion holes, small corrosion holes of anode foil, poor uniformity, etc., and achieve uniform corrosion holes, strong adaptability and excellent mechanical properties. Effect
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Embodiment 1
[0028] A process for direct current and pulse superposition etching, comprising the following steps:
[0029] Step 1: Pretreatment: Put the light foil raw material into a bath solution with a concentration of 20Wt% sulfuric acid, 3Wt% hydrochloric acid, and 1Wt% aluminum ion, and treat it at 60°C for 120Sec;
[0030] Step 2: Pore corrosion: put the aluminum foil after the above pretreatment into a bath solution with a concentration of 30wt% sulfuric acid, 3wt% hydrochloric acid, and 1wt% aluminum ion, and electrolyze at 60°C for 80Sec;
[0031] Step 3: Cleaning: Move the aluminum foil treated in step 2 into an environment of -6°C for 20 sec, and then rinse it with deionized water for 2 min;
[0032] Step 4: Hole expansion corrosion: put the treated aluminum foil into the solution of 5Wt% nitric acid, 0.2-Wt% aluminum ion and 0.01Wt% sodium polystyrene sulfonate solution at 80°C DC power-on treatment for 18 minutes;
[0033] Step 5: post-treatment: put the aluminum foil corro...
Embodiment 2
[0037] A process for direct current and pulse superposition etching, comprising the following steps:
[0038] Step 1: Pretreatment: Put the light foil raw material into a bath solution with a concentration of 30wt% sulfuric acid, 5wt% hydrochloric acid, and 2wt% aluminum ion, and treat it at 70°C for 60Sec;
[0039] Step 2: Pore corrosion: put the aluminum foil after the above pretreatment into a bath solution with a concentration of 50Wt% sulfuric acid, 5Wt% hydrochloric acid, and 2Wt% aluminum ions, and electrolyze at 80°C for 50Sec;
[0040] Step 3: Cleaning: Move the aluminum foil treated in step 2 into an environment of 0°C for 30 sec, and then rinse it with deionized water for 2 min;
[0041] Step 4: Hole expansion corrosion: Put the aluminum foil through the intermediate treatment into the solution of 10Wt% nitric acid, 0.6Wt% aluminum ion and 0.6Wt% polystyrene sodium sulfonate solution in the composition ratio of the bath solution, and direct-flow at 80°C Power on fo...
Embodiment 3
[0046] A process for direct current and pulse superposition etching, comprising the following steps:
[0047] Step 1: Pretreatment: Put the light foil raw material into a bath solution with a concentration of 25wt% sulfuric acid, 3-5wt% hydrochloric acid, and 1.5wt% aluminum ion, and treat it at 65°C for 90Sec;
[0048] Step 2: Pore corrosion: put the aluminum foil after the above pretreatment into a bath solution with a concentration of 40Wt% sulfuric acid, 4Wt% hydrochloric acid, and 1.5Wt% aluminum ion, and electrolyze at 70°C for 60Sec;
[0049] Step 3: Cleaning: Move the aluminum foil treated in step 2 into an environment at -3°C for 25 sec, and then rinse it with deionized water for 3 min;
[0050] Step 4: Hole expansion corrosion: put the treated aluminum foil into the solution of 8wt% nitric acid, 0.4wt% aluminum ion and 0.3wt% polystyrene sodium sulfonate solution in the bath composition ratio, and direct current at 70°C Power on for 15 minutes;
[0051] Step 5: pos...
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