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Corrosion-resistant plasma chemical reaction device

A plasma and chemical reaction technology, applied in the field of plasma chemical reaction devices, can solve problems such as electrode corrosion, achieve high safety, avoid heating and corrosion effects

Active Publication Date: 2022-03-18
SOUTHWESTERN INST OF PHYSICS
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0006] The purpose of this application is to provide a corrosion-resistant plasma chemical reaction device to solve the problem of cathode excitation of plasma when the reaction gas is a strong oxidizing element such as fluorine gas The bulk method will cause the problem of rapid corrosion of the electrode due to the direct contact between the electrode and the reaction gas

Method used

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Embodiment Construction

[0046] In order to enable those skilled in the art to better understand the present application, the technical solutions in the embodiments of the present application will be clearly and completely described below in conjunction with the drawings in the embodiments of the present application. Obviously, the embodiments described below are only a part of the embodiments of the present application, not all of them. Based on the embodiments described in this application, all other embodiments obtained by those skilled in the art without creative efforts are within the protection scope of this application.

[0047] In order to solve the existing technical problems, the embodiment of the present application provides a corrosion-resistant plasma chemical reaction device, which uses microwaves to directly excite plasma to promote chemical reactions, and is applicable to strong oxidative properties after ionization of fluorine gas and carbon tetrafluoride, etc. Corrosive gas, and the ...

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Abstract

The invention belongs to the technical field of plasma chemical reactions, and particularly relates to a corrosion-resistant plasma chemical reaction device which adopts microwaves to directly excite plasmas to promote a chemical reaction, can be suitable for fluorine gas, carbon tetrafluoride and other gases with strong oxidizing property and corrosivity after ionization, does not need high voltage and has relatively high safety.

Description

technical field [0001] The application belongs to the technical field of plasma chemical reaction, and in particular relates to a corrosion-resistant plasma chemical reaction device. Background technique [0002] Plasma chemical reaction is an interdisciplinary subject involving plasma physics and chemistry. It mainly studies the influence of plasma reaction substances on related chemical reactions. This subject emerged in the 1960s and 1970s. Due to the role of plasma in catalyzing chemical reactions, it is currently widely used in many fields such as materials science, optics, electronics, and medicine. [0003] The basic principle of plasma chemistry is: when a gaseous reactant is plasmaized, some of the outer electrons of its atoms gain enough ability to break free from the constraints of the atomic nucleus and become free electrons. At this time, the whole system is composed of positively charged ions and negatively charged electrons, and the electrons and positive ion...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B01J19/12B01J19/02
CPCB01J19/126B01J19/02Y02E30/10
Inventor 聂林龚少博王华杰赵伟柯锐侯和爽刘灏许敏王占辉
Owner SOUTHWESTERN INST OF PHYSICS
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