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Preparation method of high-sensitivity epoxy solder resist acrylic oligomer and photoresist or ink composition

A technology of acrylic oligomer and epoxy acrylic acid, which is applied in the direction of ink, photosensitive material for optomechanical equipment, applications, etc., can solve problems such as poor performance of immersion tin, difficulty in meeting the performance requirements of solder resist ink, and small molecular weight

Pending Publication Date: 2022-04-01
广州斯达利电子原料有限公司
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  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the directly modified novolac epoxy acrylic resin or o-cresol epoxy acrylic resin oligomer is used as the linking material, because of its short chain, small molecular weight, and resistance to developing and gold sinking, sinking tin performance Poor, so it is difficult to meet the performance requirements of the modern electronics industry for solder resist inks

Method used

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  • Preparation method of high-sensitivity epoxy solder resist acrylic oligomer and photoresist or ink composition
  • Preparation method of high-sensitivity epoxy solder resist acrylic oligomer and photoresist or ink composition
  • Preparation method of high-sensitivity epoxy solder resist acrylic oligomer and photoresist or ink composition

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preparation example Construction

[0024] The present invention also provides a method for preparing a highly photosensitive epoxy solder resist acrylic oligomer, comprising the steps of:

[0025] (1) In terms of parts by mass, react 30-40 parts of solvent, 20-40 parts of epoxy resin, 2-5 parts of epoxy resin linking agent and 0.01-0.1 part of the first type of catalyst in the reactor, and the temperature is controlled 140°C-160°C, react for 4-8 hours, and when the measured epoxy equivalent is the set value, the linked epoxy resin can be obtained. In this step, it is mainly controlled by the reaction time and the epoxy equivalent weight (EEW) after crosslinking.

[0026] (2) Add 10-15 parts of acrylic acid and / or methacrylic acid, 0.5-1 part of polymerization inhibitor and 0.1-0.5 part of the second type of catalyst in the epoxy resin of the link that step (1) obtains, and the reaction temperature is 100 ℃-135℃, the acid value should be 5-8mgKOH / g, and the measured epoxy equivalent is 15000-20000 to obtain the...

Embodiment 1

[0043] The formulations of Example 1, Example 2, Comparative Example 1 and Comparative Example 2 are shown in Table 1.

[0044] Table 1

[0045]

[0046] Wherein, solvent DCAC is diethylene glycol ethyl ether acetate;

[0047] The above formulations were prepared according to the following preparation methods to prepare epoxy solder mask acrylic oligomers respectively.

[0048] (1) According to the formula in Table 1, the solvent, epoxy resin, epoxy resin crosslinking agent and the first type of catalyst are reacted in the reactor, the temperature is controlled at 150°C-155°C, and the reaction is 5-7 hours. When the epoxy equivalent is 300-400, the chain-extended epoxy resin is obtained. In this step, it is mainly controlled by the reaction time and the epoxy equivalent weight (EEW) after crosslinking.

[0049] (2) Add acrylic acid and / or methacrylic acid, polymerization inhibitor and the second catalyst in the epoxy resin of link that step (1) obtains, and reaction temp...

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Abstract

The invention provides an epoxy solder resist acrylic oligomer for solder resist ink or photoresist with gold immersion resistance, tin immersion resistance and relatively good low dielectric constant, a preparation method of the epoxy solder resist acrylic oligomer and a photoetching or ink adhesive composition. According to the epoxy solder resist acrylic acid oligomer provided by the invention, the oxygen solder resist acrylic acid oligomer contains an epoxy group, a carboxyl group and a double bond, the weight-average molecular weight of the oxygen solder resist acrylic acid oligomer is 13000-30000, and the acid value of the epoxy solder resist acrylic acid oligomer is 4 mgKOH / g-9 mgKOH / g; and the epoxy equivalent of the oxygen solder resist acrylic acid oligomer is in a range of 30000 to 100000. The epoxy solder resist acrylic oligomer provided by the invention has the beneficial effects of large molecular weight, high sensitivity, high development latitude, high toughness, scratch resistance, excellent immersion gold resistance, immersion tin resistance, low dielectric constant and the like.

Description

technical field [0001] The invention belongs to the technical field of PCB, and in particular relates to a preparation method of a high-sensitivity epoxy solder resist acrylic oligomer for solder resist ink or photoresist, and a photoresist or ink composition. Background technique [0002] The existing oligomer binders for PCB solder resist inks are mainly directly modified novolac epoxy acrylic resins or o-cresol epoxy acrylic resins, which have certain photosensitivity, developability and surface hardness. However, the directly modified novolac epoxy acrylic resin or o-cresol epoxy acrylic resin oligomer is used as the linking material, because of its short chain, small molecular weight, and resistance to developing and gold sinking, sinking tin performance Poor, so it is difficult to meet the performance requirements of the modern electronics industry for solder resist inks. Due to the rapid technological innovation of the manufacturing process in the modern electronics ...

Claims

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Application Information

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IPC IPC(8): C08G59/17C08G59/16C08G59/14C09D11/101C09D11/102G03F7/004
Inventor 王昌华周灵康
Owner 广州斯达利电子原料有限公司