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MEMS integrated device and preparation method thereof

A technology for integrating devices and integrated circuits, which is applied in the field of MEMS and can solve the problems that MEMS devices and application-specific integrated circuits cannot be directly integrated.

Pending Publication Date: 2022-04-12
THE 13TH RES INST OF CHINA ELECTRONICS TECH GRP CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] The embodiment of the present invention provides a MEMS integrated device to solve the problem that the MEMS device and the application-specific integrated circuit cannot be directly integrated

Method used

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  • MEMS integrated device and preparation method thereof
  • MEMS integrated device and preparation method thereof
  • MEMS integrated device and preparation method thereof

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Embodiment Construction

[0034] In order to enable those skilled in the art to better understand this solution, the technical solution in this solution embodiment will be clearly described below in conjunction with the accompanying drawings in this solution embodiment. Obviously, the described embodiment is a part of this solution Examples, but not all examples. Based on the embodiments in this solution, all other embodiments obtained by persons of ordinary skill in the art without creative efforts shall fall within the protection scope of this solution.

[0035] The term "comprising" and any other variants in the description and claims of this solution and the above drawings mean "including but not limited to", and are intended to cover non-exclusive inclusion and are not limited to the examples listed herein. In addition, the terms "first" and "second", etc. are used to distinguish different objects, not to describe a specific order.

[0036] The realization of the present invention is described in...

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Abstract

The invention provides an MEMS integrated device and a preparation method thereof. The device comprises a first rewiring layer, an MEMS layer and an application-specific integrated circuit layer, the MEMS layer and the application-specific integrated circuit layer are connected through wafer-level low-temperature silicon-silicon bonding; the MEMS layer is provided with a first through hole and a second through hole which are filled with copper, the first through hole penetrates through the MEMS layer, and the second through hole penetrates through the cover plate layer and is connected with the MEMS movable structure layer; the first redistribution layer includes an internal wiring connecting the first via, the second via, and the external electrode. The internal electrode is electrically connected with the first through hole. Wafer-level integration and packaging of the MEMS device and the application-specific integrated circuit are completed through wafer-level low-temperature silicon-silicon bonding, the through holes filled with copper are formed in the MEMS layer to achieve vertical interconnection between multiple chip layers, the situation that through holes used for internal and external communication are additionally formed in the application-specific integrated circuit is avoided, copper filling is compatible with the advanced integrated circuit manufacturing process, and the manufacturing cost is reduced. The MEMS device can be directly integrated with an application-specific integrated circuit wafer of less than 90 nanometers, so that the compatibility is improved, the packaging cost is reduced, and the packaging efficiency is improved.

Description

technical field [0001] The invention relates to the technical field of MEMS, in particular to a MEMS integrated device and a preparation method thereof. Background technique [0002] MEMS (Micro-Electro-Mechanical-System, referred to as MEMS) devices and integrated circuits can work effectively. Integrated circuits are used to realize communication between MEMS devices and the outside world; integrated circuits are also used to process signals of MEMS devices, such as analog-to-digital conversion, amplification, and filtering. [0003] At present, most MEMS devices and integrated circuits are integrated and packaged together by stacked integration or side by side, and the electrical connection between chips is realized by wire bonding, in order to achieve shorter signal path length, smaller parasitic capacitance, lower interconnect resistance and smaller package size. The Fraunhofer Institute in Germany proposed the concept of MEMS three-dimensional integration technology ...

Claims

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Application Information

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IPC IPC(8): H01L23/48H01L21/50H01L21/60B81B7/02B81C3/00
Inventor 罗蓉杨拥军何洪涛徐淑静任臣
Owner THE 13TH RES INST OF CHINA ELECTRONICS TECH GRP CORP
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