High-moisturizing mask as well as preparation method and preparation device thereof
A technology for preparing a device and a mounting frame, which is applied to the field of high-hydration facial mask and its preparation, can solve the problems of increased labor, low production efficiency, reduced cutting efficiency, etc. Good skin affinity
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Embodiment 1
[0051] The high moisturizing facial mask of the present invention comprises the following components in parts by weight: 44 parts of deionized water, 12 parts of moisturizing agent, 15 parts of glycerin, 5 parts of nonionic surfactant, 15 parts of White tea extract, 26 parts of aloe extract, 20 parts of sodium hyaluronate, 12 parts of caprylyl hydroxamic acid and 4 parts of agar.
Embodiment 2
[0053] The high moisturizing facial mask of the present invention comprises the following components in parts by weight: 33 parts of deionized water, 5 parts of moisturizing agent, 6 parts of glycerin, 1 part of nonionic surfactant, 8 parts of white tea extract, 13 parts of aloe extract, 12 parts of sodium hyaluronate, 7 parts of caprylyl hydroxamic acid and 2 parts of agar.
Embodiment 3
[0055] The high moisturizing facial mask of the present invention comprises the following components in parts by weight: 38 parts of deionized water, 8 parts of moisturizing agent, 11 parts of glycerin, 3.5 parts of nonionic surfactant, 12 parts of white tea extract, 21 parts of aloe extract, 18 parts of sodium hyaluronate, 9 parts of caprylyl hydroxamic acid and 3 parts of agar.
[0056] It should be noted that the nonionic surfactant is fatty alcohol polyoxyethylene ether.
[0057] Such as figure 1 Shown in, the preparation method of the high moisturizing facial mask provided by the invention comprises the following steps:
[0058] S1. Put ionized water, humectant, glycerin, non-ionic surfactant, white tea extract, aloe extract, sodium hyaluronate and caprylyl hydroxamic acid into the mixing tank and fully stir to make a primary soaking solution. The stirring rate is controlled at 500~800r / min, and the duration is controlled at 1.5~2.5 hours;
[0059] S2. Put the above-me...
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