Preparation method of wafer-level reconfigurable Chiplet integrated structure
A wafer-level, wafer-based technology, applied in the field of preparation of wafer-level reconfigurable Chiplet integrated structures, can solve the problems of poor applicability, stability, and low integration of integrated structures, and achieve shortened development time and manufacturing difficulty, The effect of improving integration and reducing area overhead
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[0030] In order to make the implementation process of the present invention clearer, a detailed description will be given below with reference to the accompanying drawings.
[0031] The present invention provides a method for preparing a wafer-level reconfigurable Chiplet integrated structure. The specific steps are as follows:
[0032] S1, fabricating a reconfigurable topology network on a wafer and covering it with an insulating layer;
[0033] Alignment marks and power nets are included on the wafer. Alignment marks are prepared on the wafer by photolithography, which is used to reduce the error of the horizontal position of the wafer in the subsequent bonding process, so as to improve the bonding accuracy. Specifically, the alignment marks are groove-like structures distributed at intervals, and are distributed on the entire wafer. The power network is used to provide power for the Chiplets on the wafer, and the power network is a certain arrangement of copper metal wire...
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