Extensible implant microsystem heterogeneous integration method without leveling process
An integration method and microsystem technology, applied in the field of heterogeneous integration of scalable implant microsystems, can solve the problems of large-scale batch manufacturing and fragility of heterogeneously integrated implantable microsystems, and improve system integration density , Reduce the accuracy requirements, the effect of small volume
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[0043] Such as figure 1 As shown, a scalable implant microsystem heterogeneous integration method without leveling process, including the following steps:
[0044] Step 1: Embed the bare chip and surface mount device (SMD) into a polydimethylsiloxane (PDMS) carrier;
[0045] Step 2: Construct multi-layer redistribution layer (RDL) in the traditional back-end process;
[0046] Step 3: Complete the mounting of packaged chips and SMD devices on the surface of the RDL layer, and protect the chip pins to obtain an integrated microsystem.
[0047] Before embedding the bare chip and the SMD device in the step 1, the bare chip is also polished. In this example, the thickness of the bare chip is required to be polished to less than 90 μm by rotation. The process of embedding bare chips and SMD devices into PDMS carriers includes:
[0048] Step 11: Precisely place bare chips and SMD devices on the carrier substrate; wherein the carrier substrate includes materials such as glass and s...
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