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Cleaning method for removing oxide layer on surface of silicon material

A technology of surface oxidation and silicon material, which is applied in the direction of using liquid cleaning methods, cleaning methods and utensils, chemical instruments and methods, etc. Printing and other problems, to achieve the effect of low skill requirements, significant cleaning effect, and low acid consumption

Pending Publication Date: 2022-06-24
青岛晶易新材料科技股份有限公司
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  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] At present, the cleaning of silicon materials is mainly divided into alkali cleaning and pickling. Among them, pickling is the mainstream cleaning method, and the acid mixed solution is used to treat the oxide layer and various impurities on the surface of silicon materials. However, the acid consumption is large and the operation The requirement for personnel skills is high, and acid marks will appear on the surface of the silicon material due to the acid ratio and too long corrosion time, and the qualified rate is low

Method used

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  • Cleaning method for removing oxide layer on surface of silicon material
  • Cleaning method for removing oxide layer on surface of silicon material
  • Cleaning method for removing oxide layer on surface of silicon material

Examples

Experimental program
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Effect test

Embodiment 1

[0037] like figure 1 As shown, a cleaning method for removing an oxide layer on the surface of a silicon material includes the following steps:

[0038] Step S100, preparing a cleaning solution, and stirring it evenly;

[0039] In step S200, the silicon material is completely soaked in the cleaning solution, and taken out;

[0040] Step S300, rinsing and drying.

[0041] In step S100, pure water, methanesulfonic acid, ammonium bifluoride, fluoroboric acid, OP-10, AEO-3, citric acid, and sodium citrate are prepared into a cleaning solution.

[0042] OP-10 has good emulsifying, wetting, leveling, diffusing, washing and other properties, acid, alkali, hard water, OP-10 can be mixed with various surfactants and dyes.

[0043] AEO-3 can be used as solubilizer and water defoamer in other industries, and as the basic raw material for the preparation of surfactant AES. It is also a lipophilic emulsifier. Industry as solubilizer and defoamer component.

[0044] Methanesulfonic aci...

Embodiment 2

[0055] The same parts of this embodiment and the first embodiment will not be repeated, and the differences are:

[0056] Add 300 liters of pure water, 45 kg of methanesulfonic acid, 36 kg of ammonium bifluoride, 1.8 liters of fluoroboric acid, 4.5 kg of OP-10, 1.8 kg of AEO-3, 59.8 kg of citric acid, and 4.5 kg of sodium citrate into a 400L cleaning box , stir evenly, and prepare a cleaning solution. The cost of the cleaning solution is 0.02 yuan / kg, which significantly reduces the cost of the cleaning solution compared to the prior art.

[0057] The cleaning solution was diluted 3 times, the silicon material was completely soaked in the diluted cleaning solution for 30 minutes, taken out, and the metal content on the surface of the silicon material was detected. The results are shown in Figure 2(a). Cleaning operators should dress as required: wear acid-resistant aprons, acid-proof shoes, long-sleeved rubberized gloves, gas masks, and protective face shields.

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Abstract

The invention relates to a cleaning method for removing an oxide layer on the surface of a silicon material, and belongs to a silicon material cleaning technology. A cleaning solution is prepared and evenly stirred, and the silicon material is completely placed in the cleaning solution to be soaked, taken out, rinsed and dried. By optimizing the formula and proportion of the cleaning solution, the oxide layer on the surface of the silicon material can be removed only by soaking the silicon material, operation is convenient and fast, and cleaning efficiency is high. And the acid consumption is low, the skill requirement on operators is low, acid marks are avoided, and the cleaning effect is remarkable.

Description

technical field [0001] The invention belongs to the technical field of silicon material cleaning, and in particular relates to a cleaning method for removing an oxide layer on the surface of a silicon material. Background technique [0002] In today's world, fossil energy is gradually approaching exhaustion, and at the same time, a large number of mining and use have also seriously damaged the living environment of human beings. Therefore, seeking new energy to replace fossil energy has become a historical necessity. As a new type of available energy with huge content and infinite exploitation, solar energy has great prospects for development and utilization, and a series of solar photovoltaic power generation industries derived from it are also vigorous. [0003] Compared with conventional energy power generation, photovoltaic power generation has the following advantages: no fuel consumption, no geographical restrictions, energy can be obtained anywhere, can be used local...

Claims

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Application Information

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IPC IPC(8): B08B3/08B08B3/12B08B3/10B08B13/00
CPCB08B3/08B08B3/12B08B3/10B08B13/00B08B2203/007
Inventor 马鑫马成虎魏立博
Owner 青岛晶易新材料科技股份有限公司
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