Unlock instant, AI-driven research and patent intelligence for your innovation.

Display backboard and preparation method thereof

A technology of display backplane and substrate substrate, applied in the direction of semiconductor devices, electrical components, circuits, etc., can solve the problems of reducing device performance, difficult to eliminate short wave of devices, affecting device thresholds, etc., to provide performance, improve performance, enhance The effect of the shading effect

Pending Publication Date: 2022-07-26
SHENZHEN CHINA STAR OPTOELECTRONICS SEMICON DISPLAY TECH CO LTD
View PDF0 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] Embodiments of the present invention provide a display backplane and its preparation method to solve the technical problem that the short-wave light entering the device from an external light source is difficult to be eliminated, thereby affecting the threshold of the device and reducing the performance of the device

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Display backboard and preparation method thereof
  • Display backboard and preparation method thereof
  • Display backboard and preparation method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0042] like figure 1 As shown, this embodiment provides a display backplane, which includes a base substrate 1 , a short-wave shielding layer 3 , a first insulating layer 4 and a thin film transistor layer 5 .

[0043] The base substrate 1 may be a flexible substrate or a rigid substrate.

[0044] The short-wave shielding layer 3 includes a metal film layer 31 and a metal oxide film layer 32 . The short-wave shielding layer 3 can absorb the light in the short-wavelength band of the incident light source, and the remaining long-wavelength light cannot affect the performance of the active layer 51 due to its low energy.

[0045]Specifically, the metal film layer 31 is disposed on the base substrate 1 and has a thickness of The metal oxide film layer 32 is disposed on the metal film layer 31 , and the metal oxide film layer 32 is formed by oxidizing the surface of the metal film layer 31 . The metal film layer 31 can be a single-layer metal structure or a single-layer metal s...

Embodiment 2

[0073] This embodiment provides a display backplane and a manufacturing method thereof, which include all the technical solutions of Embodiment 1, the difference is that the display backplane further includes a light-shielding metal layer, and the light-shielding metal layer is provided on the base substrate 1 and the short-wave shielding between layers 3.

[0074] like Figure 4 As shown, the light-shielding metal layer and the short-wave shielding layer 3 are sequentially disposed on the base substrate 1 . In this embodiment, the orthographic projection of the short-wave shielding layer 3 on the base substrate 1 at least covers the orthographic projection area of ​​the active layer 51 on the base substrate 1, and the orthographic projection of the metal light shielding layer 2 on the base substrate 1 at least covers The orthographic projection area of ​​the active layer 51 on the base substrate 1 . In other words, the orthographic projection of the short-wave shielding lay...

Embodiment 3

[0079] This embodiment provides a display backplane and a manufacturing method thereof, which includes most of the technical solutions of Embodiment 2, and the difference lies in that the materials of the short-wave shielding layer 3 are different.

[0080] like Figure 5 As shown, this embodiment provides a display backplane, which sequentially includes a base substrate 1 , a metal light shielding layer 2 , a short-wave shielding layer 3 , a first insulating layer 4 and a thin film transistor layer 5 .

[0081] The material used for the short-wave shielding layer 3 includes at least one of metal organic framework materials, fluorine-containing aromatic organic compounds, and graphene oxide, and the thickness of the short-wave shielding layer 3 is preferably

[0082] In this embodiment, the orthographic projection of the short-wave shielding layer 3 on the base substrate 1 at least covers the orthographic projection region of the active layer 51 on the base substrate 1 . ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses a display backboard and a preparation method thereof. The display backboard comprises a substrate; the short wave shielding layer is arranged on the surface of one side of the substrate, and the short wave shielding layer has a light absorption effect; the first insulating layer is arranged on the short wave shielding layer and is far away from the surface of one side of the substrate; the thin film transistor layer is arranged on the first insulating layer and is far away from the surface of one side of the substrate; the thin film transistor layer comprises an active layer, and the active layer is arranged on the first insulating layer; wherein the orthographic projection of the short wave shielding layer on the substrate at least covers the orthographic projection area of the active layer on the substrate. The short-wave shielding layer is used for absorbing light of a short-wavelength wave band in an incident light source, and the remaining light of the long wavelength cannot affect the performance of the active layer due to low energy, so that the performance of the whole display backboard is improved.

Description

technical field [0001] The present application relates to the field of display technology, and in particular, to a display backplane and a preparation method thereof. Background technique [0002] AMOLED (Active-matrix organic light emitting diode, active matrix organic light emitting diode) technology is the development trend of the panel industry. Compared with LCD (Liquid Crystal Display, liquid crystal display panel), OLED has a simplified structure and a wider color gamut. Advantages such as faster response time. [0003] Oxide semiconductor materials are considered to be the most suitable for driving thin film transistors (TFTs) of organic light-emitting diodes (OLEDs) due to their high carrier mobility, low preparation temperature, good electrical uniformity, transparency to visible light, and low cost. One of the semiconductor active materials, oxide TFT has been widely used on the backplane of flat panel display (such as array substrate). Since oxide semiconductor ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): H01L27/32
CPCH10K59/123H10K59/124H10K59/126H10K59/1213H10K59/122
Inventor 尹福章
Owner SHENZHEN CHINA STAR OPTOELECTRONICS SEMICON DISPLAY TECH CO LTD