Polyimide positive photoresist based on alkali deactivation mechanism

A polyimide positive and positive photoresist technology, applied in the field of photoresist, can solve the problems of harsh temperature and time conditions, large exposure dose, and reduced production efficiency, so as to improve customer production efficiency and reduce production costs , the effect of strong photosensitivity

Pending Publication Date: 2022-07-29
SUNTIFIC MATERIALS WEIFANG LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the defects of this method are also obvious. First, the exposure dose required by DNQ is relatively large, usually 150mj / cm 2 The above reduces the production efficiency. Secondly, in the later stage of high-temperature imidization, due to the existence of DNQ and the high addition amount, it will cause a very high film thickness loss of more than 30%. At the same time, the temperature and time conditions required for imidization are also more Severe usually requires above 300°C

Method used

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  • Polyimide positive photoresist based on alkali deactivation mechanism
  • Polyimide positive photoresist based on alkali deactivation mechanism
  • Polyimide positive photoresist based on alkali deactivation mechanism

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0031] The weight ratio of the components of the positive photoresist composition in this embodiment is as follows: after mixing the components, fully dissolve them with the solvent propylene glycol methyl ether acetate, and then filter them with a 0.2-micron pore size filter to obtain a positive-tone photoresist composition. In the photoresist composition, the Mw of the polyamic acid resin in this embodiment is 20,000.

[0032]

Embodiment 2

[0034] The weight ratio of the components of the positive photoresist composition in this embodiment is as follows: after mixing the components, fully dissolve them with the solvent propylene glycol methyl ether acetate, and then filter them with a 0.2-micron pore size filter to obtain a positive-tone photoresist composition. In the photoresist composition, the Mw of the polyamic acid resin in this embodiment is 20,000.

[0035]

Embodiment 3

[0037] The weight ratio of the components of the positive photoresist composition in this embodiment is as follows: after mixing the components, the solvent is fully dissolved with propylene glycol methyl ether, and then filtered with a filter membrane with a 0.2-micron pore size to obtain a positive photoresist Adhesive composition, wherein, the Mw of the polyamic acid resin in this embodiment is 20,000.

[0038]

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Abstract

The invention discloses a polyimide positive photoresist based on an alkali deactivation mechanism, which comprises the following components in percentage by weight: 10-50% of polyamide acid resin, 10-50% of alkaline catalyst, 10-50% of photo-acid generator and 10-50% of solvent, and the sum of the components is 100%. 0.5%-10% of a basic catalyst; 0.5%-10% of a photoacid generator; and 50%-90% of a solvent. The invention provides a polyimide positive photoresist based on an alkali deactivation mechanism, the photoresist belongs to a chemical amplification photoresist, the photosensitivity is strong, the exposure dose can be reduced to 50-70mj/cm < 2 > by taking the photoresist thickness of 3 microns as an example, meanwhile, the imidization photoresist thickness loss is smaller, the production efficiency of customers can be greatly improved, and the production cost is reduced.

Description

technical field [0001] The present invention relates to the technical field of photoresist, in particular to a polyimide positive photoresist based on an alkali deactivation mechanism. Background technique [0002] Integrated circuit (IC) packaging is an essential link in the integrated circuit industry chain. Packaging refers to the process of processing the tested wafer to obtain an independent chip, so that the circuit chip is protected from the surrounding environment, plays the role of protecting the chip, enhancing the thermal conductivity, and communicating the internal and external circuits of the chip. important part of the circuit. [0003] A key photosensitive insulating material needs to be used in the packaging, that is, photosensitive polyimide, which is divided into positive and negative. In the current process, the positive photosensitive polyimide photoresist generally uses polyamic acid and a photosensitive compound containing diazonaphthoquinone (DNQ) to...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/004G03F7/039G03F7/32
CPCG03F7/004G03F7/0392G03F7/322
Inventor 孙逊运周元基刘聘宿磊周田田
Owner SUNTIFIC MATERIALS WEIFANG LTD
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