The present invention provides a positive
photoresist composition, a preparation method thereof, and an application, relating to the technical field of
photoresist preparation, which includes: phenolic resin, crosslinking agent, acidic catalyst, photo deactivator, and optionally a
solvent, wherein the photo deactivator includes an anionic initiator. The positive
photoresist composition of the present invention belongs to a chemically amplified photoresist. The phenolic resin therein has excellent physical and chemical properties, appropriate
dissolution rate, and good film-forming property. In the non-exposed area, the acidic catalyst catalyzes the crosslinking reaction between the crosslinking agent and the phenolic resin. After
exposure to
ultraviolet light with a
wavelength of 365 nm or 436 nm in the exposed area, the compound generated by the anionic initiator will deactivate the acidic catalyst and no longer catalyze the crosslinking reaction. The present invention solves the technical problem that the poor
photosensitivity of the photoresist leads to a large demand for
exposure dose, and achieves the technical effects of strong
photosensitivity of the photoresist, small demand for
exposure dose, improved production efficiency, and reduced production cost.