36 results about "Skin photosensitivity" patented technology

The invention relates to a preparation method for graphical sapphire substrate for epitaxial growth of nitride, which comprises the following steps of: firstly, magnetron sputtering a layer of aluminous film on the sapphire substrate; next, coating two layers of photoresist films and the lower layer of photoresist film has better photosensitivity; next, exposing and developing the substrate to form a photoresist film graph; then carrying out magnetron sputtering to a second layer of aluminous film, and dipping the aluminous film in solvent to remove the outer layer aluminous film; finally processing the substrate at lower temperature and then high temperature to form the graphical sapphire substrate with single crystal alumina film. The preparation method is simple and easy to implement, which overcomes the problems that the dry etching method will pollute and damage substrate as well as overcomes the problems that the wet etching method will cause graphic distortion.

The invention discloses 5-iodine-4-sulfur-2'-deoxyuridine, and derivatives and a synthetic method of the 5-iodine-4-sulfur-2'-deoxyuridine. The synthetic method comprises the steps of using 5-iodine-2'-deoxyuridine as main raw material, treating by using acetic anhydride under a certain conditions to obtain 3', 5'-O-dioxo acetyl-5-iodine-2'-deoxyuridine, reacting under the action of phosphorus pentasulfide, then, introducing ammonia to saturated methanol solution, stirring and deprotecting at the room temperature to obtain 5-iodine-4-sulfur-2'-deoxyuridine. According to the invention, the compound and the derivatives have greatest absorption with the ultraviolet spectrum at 345 nm and stronger UVA photosensitivity. Therefore, the compound provided by the invention is a new basic base sulfur-containing nucleosides compound, can alternatively acts on cancer cells and has potential medical value; besides, the synthetic method provided by the invention has the advantages of simple reaction conditions, accessible raw material, low cost, high product yield, high purity and high efficiency.

The invention relates to novel high-elasticity environment-friendly latex paint. The latex paint is prepared from the following components in parts by weight: 25 to 40 parts of water, 25 to 40 parts of modified acrylic emulsion, 15 to 30 parts of pigment, 5 to 8 parts of a filler, 3 to 7 parts of washed kaolin, 15 to 30 parts of ground calcium carbonate, 1 to 3 parts of a dispersing agent, 0.2 to0.6 part of a defoaming agent and 1 to 3 parts of a coalescing agent. The latex paint has the following beneficial effects: (1) the acrylic emulsion modified by organosilicon and epoxy resin can effectively improve the elasticity of the latex paint, and increase the mechanical properties and high / low temperature resistance; (2) the aluminum oxide coated titanium dioxide is adopted, so that the photosensitivity of the titanium dioxide can be effectively protected, and the weather resistance of the emulsion paint is improved; and (3) the emulsion paint prepared by the invention is simple in construction process, good in film forming process, strong in weather resistance and good in elasticity, and can be widely applied to indoor or outdoor decoration.

The invention relates to a photosensitive Zr-B-Si-C ceramic precursor and an in-situ preparation method thereof. The method is as follows: mix methyl vinyl dichlorosilane and borane dimethyl sulfide evenly, then add metal sodium for dechlorination to obtain methyl vinyl borosilane; mix chloromethyl trichlorosilane, methyl chloride Methyldichlorosilane and dichlorozirconocene are mixed evenly, then metal magnesium is added for the first heat preservation reaction, and then a reducing agent is added for the second heat preservation reaction to obtain polyzirconium carbosilane; methylvinyl borosilane and polyzirconium Carbosilane is mixed uniformly to obtain vinyl Zr-B-Si-C alkane; vinyl Zr-B-Si-C alkane is mixed with mercaptopropionate evenly, and then a photoinitiator is added to initiate a polymerization reaction to obtain the ceramic Precursor. The invention solves the problems of high viscosity, large thermal stress, and attenuation of mechanical properties of structural parts in traditional light-curing systems, and provides high-quality raw materials for light-curing 3D printing ultra-high temperature ceramic structural parts.

The invention belongs to the technical field of high polymer material preparation, and particularly relates to polyurethane, single-component light-sensitive reversible hydrogel and a preparation method and application of the single-component light-sensitive reversible hydrogel, a side chain of the polyurethane contains a beta-cyclodextrin (beta-CD) group and an azobenzene group, a main chain is based on polyethylene glycol, the preparation method is simple, and the content of functional groups is easy to control; the hydrogel prepared on the basis of the polyurethane has high photosensitivity and high response speed to white light and ultraviolet light media, can realize solution-gel-solution circulation along with irradiation of ultraviolet light-white light-ultraviolet light, and can be repeatedly used for multiple times; the hydrogel is extremely sensitive to light rays, the time T (liquid-gel) for converting a solution into a gel state is 0.5-1.5 min, the time T (gel-liquid) for converting the gel into a liquid state is 5-10 min, and the hydrogel shows excellent light response speed; the hydrogel has relatively high anti-cracking strength, and the anti-cracking strength can reach 5 to 20 kPa.

The invention provides compositions and kits including at least one nucleic acid or polypeptide molecule encoding for a mutant CoChop protein. Methods of the invention include administering a composition comprising a mutant CoChop to a subject to preserve, improve, or restore phototransduction. Preferably, the compositions and methods of the invention are provided to a subject having impaired vision, thereby restoring vision to normal levels.

The invention relates to a preparation method for graphical sapphire substrate for epitaxial growth of nitride, which comprises the following steps of: firstly, magnetron sputtering a layer of aluminous film on the sapphire substrate; next, coating two layers of photoresist films and the lower layer of photoresist film has better photosensitivity; next, exposing and developing the substrate to form a photoresist film graph; then carrying out magnetron sputtering to a second layer of aluminous film, and dipping the aluminous film in solvent to remove the outer layer aluminous film; finally processing the substrate at lower temperature and then high temperature to form the graphical sapphire substrate with single crystal alumina film. The preparation method is simple and easy to implement, which overcomes the problems that the dry etching method will pollute and damage substrate as well as overcomes the problems that the wet etching method will cause graphic distortion.

Disclosed is an agent for inhibiting or reducing light sensitivity comprising a substance that inhibits or reduces ubiquitination, for example, an agent for inhibiting or reducing light sensitivity capable of protecting a retina, reducing retinal degeneration, reducing aging of a retina and / or reducing hyperesthesia. The present invention is suitable for use in amelioration or prevention of a symptom associated with light reception, such as age-related macular degeneration, retinitis pigmentosa, Leber congenital amaurosis, Stargardt disease, cone-rod dystrophy, diabetic retinopathy, macular edema, retinal ischemia, photosensitive seizure, photosensitive epilepsy, psychiatric disorders, photic maculopathy, asthenopia, retinal dysfunction, sleep disorders, migraine and light-induced damage.

The invention discloses a preparation method of a double-sensitivity cyclodextrin supermolecule aggregate, belonging to the technical field of functional materials. The preparation method comprises the following steps of preparing a host molecule-photosensitive 4-hydroxycinnamic acid-cyclodextrin (4HCA-CD) by using 4-hydroxycinnamic acid (4HCA) to modify beta-cyclodextrin (beta-CD); using trithioester with adamantine (AD) at tail end as a chain transfer agent, and preparing temperature-sensitive object polymer-double-arm adamantine-poly(N-isopropyl acrylamide)-adamantine (AD-PNIPAM-AD) by using a reversible addition-fragmentation chain transfer free radical polymerization (RAFT) method; constructing a double-sensitivity supermolecule inclusion complex 4HCA-CD / AD-PNIPAM-AD by utilizing comprehensive performance of a beta-CD dewatering cavity and AD; and self-assembling the 4HCA-CD / AD-PNIPAM-AD to form the supermolecule aggregate which is capable of realizing reversible conversion in shape and size by changing light and temperature. The supermolecule aggregate prepared by the preparation method disclosed by the invention has good light / temperature double sensitivities and is capable of carrying out smart response onto external stimulus, so that the supermolecule aggregate has a wide application prospect in the fields of drug loading, controlled release, and the like.