The invention provides a positive
photoresist composition and a preparation method and application thereof, and relates to the technical field of
photoresist preparation, the positive
photoresist composition comprises phenolic resin, a cross-linking agent, an acid catalyst, a photoinduced deactivator and an optional
solvent, and the photoinduced deactivator comprises an anionic initiator. The positive photoresist composition belongs to
chemical amplification photoresist, the phenolic resin in the positive photoresist composition has excellent physical and chemical properties, proper
dissolution rate and good film-forming property, in a non-
exposure area, an acid catalyst catalyzes a cross-linking agent to be subjected to a cross-linking reaction with the phenolic resin, and after the positive photoresist composition is exposed by
ultraviolet light with the
wavelength of 365 nm or 436 nm in an
exposure area, the compound generated by the anionic initiator deactivates the acidic catalyst and does not catalyze the cross-linking reaction any more. According to the invention, the technical problem of large
exposure dose demand caused by poor
photosensitivity of the photoresist is solved, and the technical effects of high
photosensitivity of the photoresist, small exposure
dose demand, improvement of production efficiency and reduction of production cost are achieved.